Impurity control

This approach enables also to substantiate acceptance criteria for detection and qualification limits in impurity control method validation. 

Gruen, D. M., Vepfek, S., and Wright, R. B. Plasma-Materials Interactions and Impurity Control in Magnetically Confined Thermonuclear Fusion Machines. 89, 45-105 (1980). 

For nonstoichiometric compounds, the general rule is that when there is an excess of cations or a deficiency of anions, the compound is an n-type semiconductor. Conversely, an excess of anions or deficiency of cations creates a / -type semiconductor. There are some compounds that may exhibit either p- or n-type behavior, depending on what kind of ions are in excess. Lead sulfide, PbS, is an example. An excess of Pb + ions creates an n-type semiconductor, whereas an excess of ion creates a /7-type semiconductor. Similarly, many binary oxide ceramics owe their electronic conductivity to deviations from stoichiometric compositions. For example, CU2O is a well-known / -type semiconductor, whereas ZnO with an excess of cations as interstitial atoms is an n-type semiconductor. A partial list of some impurity-controlled compound semiconductors is given in Table 6.9. 

X-ray fluorescence can be used to analyse all types of samples. Its applications are numerous, whether in research and development or in quality control of production. Initially, X-ray fluorescence was used in industries that treat metals of primary fusion or alloys and, more generally, in the mineral industry (for use one ceramics, cements, steel, glass, etc.). Because of the ease of use of common X-ray fluorescence instruments, its scope of application has expanded into other areas the photographic industry and semi-conductors (for impurity control in silicon chips), the petroleum industry, geology, paper mills, gas analyses (such as nitrogen), toxicology and environmental applications (dust, fumes from combustion, heavy metals, and dangerous materials in waste such as Pb, As, Cr, Cd, etc.). 

Plasma-Materials Interactions and Impurity Control in Magnetically Confined Thermonuclear Fusion Machines ... 

A practical problem is that the sputtered chemical complexes often exhibit only a transitory existence. Traditional mass spectrometric techniques provide information on gross removal but little understanding of the mechanism involved. Data requirements in this area include gross removal rates, nature of ejected species, and changes to surface stoichiometry. In Sect. 6.5.1., the influence of surface chemistry on the nature of the sputtered species, and in particular on secondary ion fractions will be discussed. The role of surface chemistry and surface modification procedures on impurity control will be elucidated there. 

A variety of techniques leading to increased ion fractions are under investigation with a view to assessing the potential of this approach for impurity control in Tokamaks167 171. ... 

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