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Imprinting pressure

Labeler. Applies and imprints (pressure-sensitive) labels to moving containers, generally at the same speed and in the same direction of the flow of the product. [Pg.646]

One example of commercial UV nanoimprint resists is shown in Table 4.1. Since the resist is of a liquid form, spin coating can be applied for forming the layer. An imprint is performed under room temperature at low imprint pressure (>100 mbar) in vacuum (or atmospheric pressure). UV light is exposed by an i-line lamp. [Pg.128]

Process condition Imprint room temperature, low imprint pressure (>100 mbar), imprint in vacuum or under atmospheric pressure UV exposure broad band or i-line, curing few seconds... [Pg.128]

Injection molding requires the barrel temperature to be about 350°C with a barrel pressure in excess of 138 MPa. The mold is maintained at 110°C to ensure uniform flow and high definition, and to discourage an uneven index of refraction, birefringence. The CD is about four one-hundredths of an inch (0.5 mm) thick. For prerecorded CDs, the PC is compression-molded on a stamper imprinted with the recorder information. This takes about 4 sec. Once the clear piece of polycarbonate is formed, a thin, reflective aluminum layer is sputtered onto the disc. Then, a thin acrylic layer is sprayed over the aluminum to protect it. The label is then printed onto the acrylic surface and the CD is complete. This process is described later in greater detail. [Pg.102]

Figure 2 Typical PL enhancements due to exposure to amines (a) etched n-CdSe surface exposed to ammonia (b) etched w-CdSe surface exposed to trimethylamine (c) n-CdSe coated with a trimethylamine-imprinted PAA film exposed sequentially to ammonia and trimethylamine and (d) n-CdSe coated with an ammonia-imprinted poly(acrylic acid) (PAA) film exposed sequentially to ammonia and ttimethylamine. Nitrogen gas was used as the reference ambient between exposures to the amine-containing ambients with the indicated partial pressures. Samples were excited at 633 nm and the PL was monitored at 720 nm. Figure 2 Typical PL enhancements due to exposure to amines (a) etched n-CdSe surface exposed to ammonia (b) etched w-CdSe surface exposed to trimethylamine (c) n-CdSe coated with a trimethylamine-imprinted PAA film exposed sequentially to ammonia and trimethylamine and (d) n-CdSe coated with an ammonia-imprinted poly(acrylic acid) (PAA) film exposed sequentially to ammonia and ttimethylamine. Nitrogen gas was used as the reference ambient between exposures to the amine-containing ambients with the indicated partial pressures. Samples were excited at 633 nm and the PL was monitored at 720 nm.
Figure 3 Fractional surface coverage 0. determined using Eq. (3), as a function of ammonia pressure for (a) an etched w-CdSe crystal and (b) a n-CdSe crystal coated with an ammonia-imprinted PAA film. The insets show the same data as double reciprocal plots, yielding equilibrium constants for (a) and (b) of 750 250 and 1000 500... Figure 3 Fractional surface coverage 0. determined using Eq. (3), as a function of ammonia pressure for (a) an etched w-CdSe crystal and (b) a n-CdSe crystal coated with an ammonia-imprinted PAA film. The insets show the same data as double reciprocal plots, yielding equilibrium constants for (a) and (b) of 750 250 and 1000 500...
Trial and error was necessary to achieve the correct depth and texture for the fill. In addition, it was necessary to quickly reduce the suction as soon as the fill was correctly placed to avoid texturing the fill with the imprint of the suction table screen. The fills were dried under pressure sufficient only to hold the fill and surrounding tapa flat as moisture evaporated. [Pg.178]

Whilst the development of new adsorbents on monolithic [62] or fibrous supports [63] to cut pressure drops, of high-capacity metal organic frameworks (MOFs) [64], or of highly selective molecularly imprinted polymers (MIPs) [65], is certainly beneficial for the realization of novel adsorptive reactive concepts, the serendipity of catalytic chemistry and the accompanying adsorption process remains the crucial factor for the success or otherwise of an adsorptive reactor. Thus, although a healthy degree of skepticism is appropriate when assessing the suitability of an adsorptive... [Pg.229]

Tamper-proof seals are added to discourage unauthorized or undetected field adjustments. Once testing is complete, a metal identification tag (of soft lead, which is easy to imprint, yet impervious to corrosion) is attached to the SRV. The tag records the location number, set pressure, and test date. [Pg.235]

Machined parts were given matt or polished surfaces by tumbling in appropriate media. Trade-marks and stock numbers were applied by hot-blocking in small hand-operated presses, using heat and pressure to emboss and to imprint contrasting colour from film or foil. [Pg.36]

As can be seen from Figure 2 the adsorption branch of this isotherm exhibits two distinct steps that reflect the capillary condensation inside smaller or larger mesopores at relative pressures about 0.79 and 0.9, respectively. The condensation in the relative pressure range of 0.9S-0.99S reflects condensation in secondary mesopores or small macropores, which resulted from the imprinting of agglomerates of colloidal particles. To our knowledge, this kind of isotherm has not been reported for porous carbon materials. The pore size distribution for this mesoporous carbon shown in Figure 3 exhibits two distinct peaks located about 11 nm and 24 nm, which correspond to the particle size of Bindzil 30/360 and Ludox AS-40 colloidal silicas, respectively. [Pg.138]

CHROMATOGRAPHIC RETENTION OF TRIAZINES (10 NMOLE INJECTED SEPARATELY) ON AME IMPRINTED POLYMERS PREPARED AT DIFFERENT PRESSURES [110]... [Pg.152]


See other pages where Imprinting pressure is mentioned: [Pg.1798]    [Pg.4]    [Pg.6]    [Pg.8]    [Pg.8]    [Pg.8]    [Pg.9]    [Pg.11]    [Pg.260]    [Pg.1798]    [Pg.4]    [Pg.6]    [Pg.8]    [Pg.8]    [Pg.8]    [Pg.9]    [Pg.11]    [Pg.260]    [Pg.578]    [Pg.34]    [Pg.34]    [Pg.620]    [Pg.131]    [Pg.39]    [Pg.154]    [Pg.296]    [Pg.40]    [Pg.844]    [Pg.578]    [Pg.294]    [Pg.156]    [Pg.285]    [Pg.593]    [Pg.594]    [Pg.33]    [Pg.426]    [Pg.49]    [Pg.264]    [Pg.276]    [Pg.265]    [Pg.196]    [Pg.310]    [Pg.495]    [Pg.60]    [Pg.62]    [Pg.217]   
See also in sourсe #XX -- [ Pg.3 , Pg.7 , Pg.10 ]




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