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Substrate conformal imprint lithography

Substrate Conformal Imprint Lithography (SCIL) is a relatively new technique developed jointly by Philhps and Suss Microtec AG [57, 58]. It uses flexible soft stamp technology combined with an elegant vacuum controlled technique for the stamp imprint and retraction process. [Pg.458]

Ji R, Hornung M, Verschuuren MA et al (2010) UV enhanced substrate conformal imprint lithography (UV-SCIE) technique for photonic crystals patterning in EED manufacturing. Microelectron Eng 87 963-967... [Pg.466]

Verschuuren MA (2010) Substrate conformal imprint lithography for nanophotonics. PhD thesis, Utrecht University... [Pg.466]

See other pages where Substrate conformal imprint lithography is mentioned: [Pg.458]    [Pg.466]    [Pg.458]    [Pg.466]    [Pg.1796]    [Pg.19]    [Pg.214]    [Pg.8]    [Pg.93]    [Pg.143]    [Pg.8]   
See also in sourсe #XX -- [ Pg.458 ]



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