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Imprinting nano-lithography

Hua, E et al. 2004. Polymer imprint lithography with molecular-scale resolution. Nano Lett. 4 2467-2471. [Pg.443]

Dauksher W, Le N, Ainley E, Nordquist K, Gehoski K, Young S, Baker J, Convey D, Mangat P. Nano-imprint lithography templates, imprinting and wafer pattern transfer. Microelectronic Engineering 2006, 83, 929-932. [Pg.240]

S. Y. Chou, Nano-imprint lithography and lithographically induced self-assembly, MRS Bull 26 (2001) 512. [Pg.634]

Imprint lithography also have several limitations for many applications because it can in principle only be used for small periodic structures. A general fabrication technology for all kinds of applications should be able to realize various combinations and distributions of large as well as small features [50]. Beside the imprint technology it is also possible to use the mold as an ink stamp (Nano Imprint Lithography (NIL). The ink is a chemical solution with certain properties and is applied to the substrate. Consequently it left the chemical on the contact area and after that it can be used as a mask. [Pg.277]

Figures 7(b) and (cl) illustrate the thermal signatures of two different polymers mr-I8030, Figure 7(b), is a polymer designed for nano-imprint lithography and NEB 22, Figure 7(d), is a negative e-beam photoresist formulated by Sumimoto Chemical. The glass transition temperature, T, is observed on the reversing curve at... Figures 7(b) and (cl) illustrate the thermal signatures of two different polymers mr-I8030, Figure 7(b), is a polymer designed for nano-imprint lithography and NEB 22, Figure 7(d), is a negative e-beam photoresist formulated by Sumimoto Chemical. The glass transition temperature, T, is observed on the reversing curve at...
For single-nanowire devices, highly expensive techniques (such as a focused ion beam, or a series of nano-lithographic tools) must be used, ranging from proton and electron beam nanoUthography, in which patterned substrates are obtained under the application of a charged particle beam, to nano-imprint lithography. ... [Pg.307]

Fabrication of Devices and Circuits Soft and Nano-Imprint Lithography... [Pg.1304]

Hwang, J. Hong, S.-H. Lee, H., Mimicking the Nanostructure of Bamboo Leaves (Backside) for Hydrophobicity Using PolydimethylsUoxane Moulding and Nano-Imprint Lithography. J. Nanosci. Nanotech. 2009,9,3644-3647. [Pg.134]

Rogers, J.A. Shim, A. (2004). Polymer Imprint Lithography with Molecular-Scale Resolution. Nano Letters, 4, 2467-2471. [Pg.205]

Fig. 13.7 Step and Flash Nano Imprint Lithography a wafer coated in photoresist b master stamp imprinted into resist c UV curing flash step to selectively harden resist d stamp retracted from resist... Fig. 13.7 Step and Flash Nano Imprint Lithography a wafer coated in photoresist b master stamp imprinted into resist c UV curing flash step to selectively harden resist d stamp retracted from resist...
Palmieri F, Adams J, Long B et al (2007) Design of reversible cross-linkers for step and flash imprint lithography imprint resists. ACS Nano 1 307-312... [Pg.464]

Han T., Madden S., Bulla D., and Luther-Davies B., Low loss chalcogenide glass waveguides by thermal nano-imprint lithography, Opt. Express, 18,19286-19291 (2010). [Pg.255]

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See also in sourсe #XX -- [ Pg.380 ]



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