Image development

Nickel salts and soaps have been used in electrosensitive copy paper for image development. Nickel bis-(3,5 di-Z fZ-butylsaHcylate) [68569-24-4] has been studied in pressure-sensitive color developer sheets (201). It has also been used for color stabili2ation of color copy paper (see Electroplating). 

Phenylenediamines are used in a variety of other appHcations, such as corrosion inhibitors, cross-linking agents for epoxy resins, toners for electrostatic image development (35), and to improve wrinkle resistance of cellulose acetate fibers (36). 

Developed grains (low covering power) Release layer Protector layer for positive image Developed positive grains 1 (high covering power) Protector layer for color screen Additive color screen... 

AgBr crystal + latent image] + developer —> Ag crystal... 

The alternating tendency of the copolymers is advantageous in that the polymerizations can be carried out to high conversions with little or no compositional drift. For random copolymerizations in which there is preferential incorporation of one monomer due to a mismatch in reactivity ratios, the compositional variations with conversion can be substantial. Such compositional heterogeneities in resist materials can lead to severe problems during image development. 

Not always is the PFR a side undesired reaction in polymers. In some cases, it has been used for practical purposes like selective image development [248], Another important use of the PFR is the photostabilization of polymers [249]. Aromatic esters and polyesters are sometimes mixed with other polymers in order to protect them from light. This delays aging of the polymer because the light is... 

The relative rate of fog formation compared to image development increases with increasing pH of the hydroxylamine solution. This is to be expected from analogy with the studies of the reduction of silver chloride and silver bromide precipitates, where the change in nitrogen yield shows that the uncatalyzed reaction becomes more and more prominent as the pH is increased. 

Data obtained by Shiberstoff (63) on the development of photographic film in solutions of conventional developers offer further evidence in confirmation of the latter point. Shiberstoff obtained a general increase in selectivity with decreasing temperature of development for all agents tested. He calculated selectivity in terms of the ratio of the rate of image development to fog formation, using as the rate of the former the reciprocal of the time required to attain a density of 1.5 for a fixed... 

Apparently, the solubility of novolac resin in aqueous base is sufficiently altered by the pendant amine to facilitate image development. 

Development of Resist Patterns. Development was done in AZ2401 developer diluted with 2 to 5 times its volume of water AZ2401 is an aqueous solution of KOH with a surfactant. When the resist films were exposed to electron beam doses of 5 iC/cm2 at 25 keV, it usually took 1.5 to 2.0 min for complete development of the images using a diazo-naphthoquinone sensitizer with o-chloro-cresol-formaldehyde Novolak resin in (1 3) AZ2401/water developer. With poly(2-methyl-l-pentene sulfone) the chlorinated Novolak resin exposed to I juC/cm2, it took 2.0 min in (1 4) AZ2401 developer for complete image development. 

Although the Novolak resin of the w-cresol-benzaldehyde failed to show a marked increase in CF4 plasma etching resistance, the Novolak resins of hydroxy-naphthalene-hydroxybenzaldehyde showed a remarkable increase in the plasma etching resistance. The resist films also yielded excellent patterns when used together with a diazo-naphthoquinone sensitizer almost non-diluted AZ2401 developer had to be used for image development due to the hydrophobic nature of the naphthalene group. 

In the report of positive-tone Novolak resins containing no dissolution inhibitor, Fahrenholtz proposed a similar mechanism for image development (19). 

Fig. 27.7 Long-term image development and influencing factors.

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