Big Chemical Encyclopedia

Chemical substances, components, reactions, process design ...

Articles Figures Tables About

Fluorine-doped tin oxide

CVD, the other major deposition process, is used on a large scale. A typical low-E glass is obtained by depositing a thin film of silicon dioxide followed by another thin film of fluorine-doped tin oxide. The Si02 acts as a diffusion barrier and the Sn02 reduces the emissivity. A typical CVD apparatus is shown in Fig. [Pg.413]

Figure 10.17. (a) Schematic diagram of the nanowire dye-sensitized solar cell. Light is incident through the bottom electrode, (b) SEM cross section of a solution-fabricated ZnO nanowire array on fluorine-doped tin oxide. The wires are in direct contact with the substrate. Scale bar, 5 pm. Reproduced from Ref. 41, Copyright 2005, with permission from the Nature Publishing Group. [Pg.335]

To detail DSSC technologies, Fig. 18.1 illustrates the modus operandi of DSSCs. Initially, light is absorbed by a dye, which is anchored to the surface of either n- or p-type semiconductor mesoporous electrodes. Importantly, the possibility of integrating both types of electrodes into single DSSCs has evoked the potential of developing tandem DSSCs, which feature better overall device performances compared to just n-or p-type based DSSCs [19-26]. Briefly, n-type DSSCs, such as TiOz or ZnO mesoporous films, are deposited on top of indium-tin oxide (ITO) or fluorine-doped tin oxide (FTO) substrates and constitute the photoanodes. Here, charge separation takes place at the dye/electrode interface by means of electron injection from the photoexcited dye into the conduction band (cb) of the semiconductor [27,28]. A different mechanism governs p-type DSSCs, which are mainly based on NiO electrodes on ITO and/or FTO substrates... [Pg.476]

Substrates DME = dropping mercury electrode FTO = fluorine-doped tin oxide G = graphite GC = glassy carbon GrC = graphic carbon ITO = indium tin oxide-coated glass SC = single crystals SS = stainless steel TCO = transparent conducting oxide VC = vitrious carbon. Miscellaneous ECALE = electrochemical atomic layer epitaxy ED = electrodeposition ML = monolayer RT = room temperature SMD = sequential monolayer deposition V = vacuum. [Pg.93]

Usually the nanotube arrays have been made from a titanium thick film or foil, in which case the resulting nanotubes rest upon an underlying Ti substrate as separated by a barrier layer. The nanotube arrays have also been fabricated from a titanium thin film sputtered onto a variety of substrates, such as silicon and fluorine doped tin oxide (FTO) coated conductive glass. This extends the possibility for preparing technical catalysts by deposing a thin Ti layer over a substrate (a foam, for example) and then inducing the formation of the nanostructured titania film by anodic oxidation. ... [Pg.103]

Examples of the application of solid state electrochemistry to identifying dyes in textile samples can be provided. Thus, Fig. 2.17 compares the square wave voltam-mograms of (a) saffron blank, and (b) sample from a Tibet temple, attached to fluorine-doped tin oxide (FTO) electrodes immersed into acetate buffer. After initiating the potential scan at -0.85 V in the positive direction, two separated oxidation... [Pg.54]

FTO — Usual acronym for fluorine-doped tin oxide . Tin oxide is a -> semiconductor transparent to light in the visible range of the spectrum and fluorine doping is... [Pg.285]

Pommier R., Gril C., Maruchi J. Sprayed films of indium tin oxide and fluorine-doped tin oxide of large surface area. Thin Sohd Films 1981 97 91-7. [Pg.144]

Figure 48. Scheme of a photoelectrochemical cell constituted by two conducting glass electrodes (FTO = fluorine doped tin oxide) one side coated with a film of Ti02, as the semiconducting photoactive interface and a redox mediator (la/I ) dissolved in methoxipropionitrile. A thin platinum film is also employed to improve the electrical contact with the second electrode. [Pg.440]

Direct electron transfer between CCP and an electrode was first reported (45) for the nonphysiological one-electron reduction and reoxidation of ferric CCP at fluorine-doped tin oxide. Overpotentials of around 0.5 V were required to drive this electrode reaction in either direction at measurable rates. A more successful approach to direct electroreduction of compound I, described by Armstrong and Lannon (46), employed edge-plane graphite electrodes in the presence of... [Pg.360]

Transparent conductive coatings combine high optical transmission with good electrical conductivity. The existence of both properties in the same material is, from the physics point of view, not trivial and is only possible with certain semi-conductors like indium oxide, tin oxide, cadmium oxide, and with thin gold and silver films, e.g. [157]. Particularly antimony or fluorine doped tin oxide (ATO, FTO), tin doped indium oxide (ITO), and aluminium, indium, or boron doped zinc oxide (AZO, IZO, BZO) are of technical importance [157a]. [Pg.482]

At the same time, SWNT can be used at the top electrode (that needs to be transparent) as a replacement for the currently used thin films that are also electrical conductors. Typical conductive thin films used today are oxides such as fluorine-doped tin oxide (FTO), Al-doped zinc oxide, and the indium tin oxide (ITO) mentioned above. The disadvantages of these oxide films are that they require expensive deposition procedures at high vacuum, they have poor mechanical properties, and they are not transparent in the infrared. Another interesting difference is that transparent oxide conductors are n-type semiconductors. By contrast, nanotube networks act as p-type semiconductors, which could lead to new designs. [Pg.473]

The device fabrication process is illustrated in Figure 11.18a and can be described in the following steps. Step-I is the selection of two transparent substrates coated with a transparent conductor such as ITO, fluorine-doped tin oxide (FTO), or a high conductivity polymer, etc. In Step-II, one substrate... [Pg.343]

FTO Fluorine-doped tin oxide, a transparent conductive oxide, typically... [Pg.122]

Figure 8.6 The dip-coating deposition of C-SWCNT solutions on fluorine doped tin oxide (a) A schematic outline of the dip-coating procedure that was used to assemble carboxy-SWNTs. (b) FESEM image of carboxy-SWNTs deposited on to neat fluorine-tin-oxide sample from acetonitrile solution by vertically dip-coating the neat fluorine-tin-oxide in carboxy-SWNT dispersion with a pulling speed of 0.05 mm min (the arrow indicates the pulling direction). Reproduced with permission from Valentini et al ... Figure 8.6 The dip-coating deposition of C-SWCNT solutions on fluorine doped tin oxide (a) A schematic outline of the dip-coating procedure that was used to assemble carboxy-SWNTs. (b) FESEM image of carboxy-SWNTs deposited on to neat fluorine-tin-oxide sample from acetonitrile solution by vertically dip-coating the neat fluorine-tin-oxide in carboxy-SWNT dispersion with a pulling speed of 0.05 mm min (the arrow indicates the pulling direction). Reproduced with permission from Valentini et al ...

See other pages where Fluorine-doped tin oxide is mentioned: [Pg.114]    [Pg.595]    [Pg.721]    [Pg.335]    [Pg.302]    [Pg.483]    [Pg.465]    [Pg.340]    [Pg.504]    [Pg.157]    [Pg.303]    [Pg.414]    [Pg.493]    [Pg.360]    [Pg.375]    [Pg.276]    [Pg.468]    [Pg.241]    [Pg.486]    [Pg.744]    [Pg.415]    [Pg.159]    [Pg.351]    [Pg.129]    [Pg.43]    [Pg.3]    [Pg.185]    [Pg.58]    [Pg.59]    [Pg.20]   
See also in sourсe #XX -- [ Pg.476 ]

See also in sourсe #XX -- [ Pg.157 ]

See also in sourсe #XX -- [ Pg.422 ]




SEARCH



Fluorinated oxidizers

Fluorination oxidative

Fluorine oxides

Fluorine-doped tin oxide electrode

Oxidative doping

Tin doping

Tin oxide

© 2024 chempedia.info