Film-thickness monitors

Sensitivity is defined as the exposure energy necessary for 50% resist thickness remaining in the exposed areas. Contrast values are assessed by measuring the slope of the linear portion of the curve obtained by plotting the thickness of the relief image as a function of the logarithm of the exposure energy (15). The film thickness was measured with a Nanospec AFT film thickness monitor (Nanometrics). 

Acoustic Wave Analysis of the Operation of Quartz Crystal Film Thickness Monitors. 

Figure 6. Response of the film thickness monitor for a 1.4 (im-thick film of poly(methylmethacrylate) dissolving in methyl ethyl ketone at 21.8 °C.

Figure 7. Response of the film thickness monitor during dissolution of a 0.465 (Jim-thick film of Microposit 2400-17 on a 1.5 (im-thick HB206 film. The solvent is a 1 3.5 mixture of AZ400K developer and water at 27.1 °C.

In order to confirm that the film thicknesses monitored on quartz were the same as those on aluminum under identical coating conditions, the following experiment was performed. Sample films on aluminum, 10 cm2, were obtained for each polymer under coating conditions established on quartz. The polymer films were dissolved off the aluminum support with methylene chloride into 10 mL volumetric flasks. The... 

Measuring arrangement of the optical film thickness monitor A Modulated light source E Test glass changer Receiver Refl. F Light beam deflection... 

Measuring arrangement of the optical film Thickness monitor of HONEYWELL. 

QCMs have been used as film-thickness monitors in vacuum deposition of metals and inorganic solids since the 1970s. The monograph by Lu and Czandema [35], while over 20 years old, is still a very good summary of early applications of the quartz crystal microbalance in physics and engineering, as well as applications as thickness monitors in the vacuum deposition industry. Well before the fiill... 

A miniaturized spectrometer with CCD array for mounting on a printed circuit card inside the electronics has been developed for a film thickness monitor (18, 19). Light from the input fibre is focused by a 40 mm achromatic lens on to a blazed reflection grating with 300 lines/mm. A 50-element CCD array gives a spectral resolution of 10 nm. The spectrometer is 10 mm thick and 80 mm long. Spectrometers made by integrated optics have also been suggested (20). 

Bulk wave devices are commonly used as deposited mass or film thickness monitors in vacuum deposition systems. Their use in this context has been described by Czanderna (5) and is the subject of a continuing series of monographs (39). Bulk wave mass detectors have also been applied to the detection and quantitation of aerosols and suspended particles. Surface deposition was achieved by the use of a surface adhesive (40), electrostatic precipitation (41), or inertial impact (42). The mass sensitivity of bulk wave devices appears more than adequate for these applications, and there are no reports in the literature of the development of simple SAW device mass sensors which potentially could yield higher mass sensitivities. 

Enter on the film thickness monitor the density of the metal used (19.30 g/cm for gold) and the desired thickness of the sputtered metal layer. 

Put the discharge voltage on 1 kV and press start on the film thickness monitor. Adjust the plasma current to 25 mA for homogenous coverage. 

Technical Problems. The use of the QCM as an evaporated film thickness monitor or as a device for determining surface gas adsorption... 

The systematic diagram in Fig.l depicts the experimental apparatus used for sliding tests in an ultra-high vacuum condition. It basically consists of a Si wafer specimen through which a direct current was supplied to heat the Si wafer, an Ag evaporating source by electron beam bombardment, quartz-oscillation film-thickness monitor, W-filament to dissociate hydrogen gas to adsorb the atomized hydrogen, and a slider arm with a diamond spherical pin which moves-reciprocally. 

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