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Plasma and current

J. Po2hela, Plasma and Current Instabilities in Semiconductors Pergamon Press, Inc., Oxford, U.K., 1981. [Pg.119]

The analytical plasmas are classified according to the method of power transmission to the working gas. There are three dominant types of plasma source in use today (i) Inductively coupled plasmas, ICPs (ii) Direct current plasmas, DCPs (current carrying DC plasmas and current-free DC plasmas) (iii) Microwave plasmas (microwave induced plasmas, MIPs, and capacitively coupled microwave plasmas, CMPs). [Pg.155]

See other pages where Plasma and current is mentioned: [Pg.117]    [Pg.108]   
See also in sourсe #XX -- [ Pg.325 , Pg.326 ]



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