Microelectronic fabrication Chemical Vapor Deposition

Deposition of Thin Films. Laser photochemical deposition has been extensively studied, especially with respect to fabrication of microelectronic stmctures (see Integrated circuits). This procedure could be used in integrated circuit fabrication for the direct generation of patterns. Laser-aided chemical vapor deposition, which can be used to deposit layers of semiconductors, metals, and insulators, could define the circuit features. The deposits can have dimensions in the micrometer regime and they can be produced in specific patterns. Laser chemical vapor deposition can use either of two approaches. 

Chemical vapor deposition is a key process in microelectronics fabrication for the deposition of thin films of metals, semiconductors, and insulators on solid substrates. As the name indicates, chemically reacting gases are used to synthesize the thin solid films. The use of gases distinguishes chemical vapor deposition (CVD) from physical deposition processes such as sputtering and evaporation and imparts versatility to the deposition technique. 

Modeling of Chemical Vapor Deposition Reactors for the Fabrication of Microelectronic Devices... 

Chemical vapor deposition is not restricted to the microelectronics industry. It is the key process in the fabrication of optical fibers where it enables grading of the refractive index as a function of the radial position in the fiber (JO. In the manufacturing industry the technique provides coatings with special properties such as high hardness, low friction, and high corrosion resistance. Examples of CVD reactions and processes are given in Table 1. 

Jensen, K. F., Modeling of chemical vapor deposition reactors for the fabrication cf microelectronic devices, in Chemical and Catalytic Reactor Modeling. Washington, D.C. American Chemical Society, 1984. 

The study of small and intermediate-sized clusters has become an important research field because of the role clusters play in the explanation of the chemical and physical properties of matter on the way from molecules to solids/ Depending on their size, clusters can show reactivity and optical properties very different from those of molecules or solids. The great interest in silicon clusters stems mainly from the importance of silicon in microelectronics, but is also due in part to the photoluminescence properties of silicon clusters, which show some resemblance to the bright photoluminescence of porous silicon. Silicon clusters are mainly produced in silicon-containing plasma as used in chemical vapor deposition processes. In these processes, gas-phase nucleation can lead to amorphous silicon films of poor quality and should be avoided.On the other hand, controlled production of silicon clusters seems very suitable for the fabrication of nanostructured materials with a fine control on their structure, morphological, and functional properties. ... 

Plasmas are used in three major microelectronics processes sputtering, plasma enhanced chemical vapor deposition (PECVD), and plasma etching. In each, the plasma is used as a source of ions and/or reactive neutrals and is sustained in a reactor so as to control the flux of neutrals and ions to a surface. The typical ranges of properties for a glow discharge used in microelectronic fabrication are as shown in Table I. 

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