Electrodeposition buffers

Cu9ln4 and Cu2Se. They performed electrodeposition potentiostatically at room temperature on Ti or Ni rotating disk electrodes from acidic, citrate-buffered solutions. It was shown that the formation of crystalline definite compounds is correlated with a slow surface process, which induced a plateau on the polarization curves. The use of citrate ions was found to shift the copper deposition potential in the negative direction, lower the plateau current, and slow down the interfacial reactions. 

It was reported recently [216] that optical-quality PbTe thin films can be directly electrodeposited onto n-type Si(lOO) substrates, without an intermediate buffer layer, from an acidic (pH 1) lead acetate, tellurite, stirred solution at 20 °C. SEM, EDX, and XRD analyses showed that in optimal deposition conditions the films were uniform, compact, and stoichiometric, made of fine, 50-100 nm in size, crystallites of a polycrystalline cubic structure, with a composition of 51.2 at.% Pb and 48.8 at.% Te. According to optical measurements, the band gap of the films was 0.31 eV and of a direct transition. Cyclic voltammetry indicated that the electrodeposition occurred via an induced co-deposition mechanism. 

Successful electrodeposition of Sb2To3 has been reported for the first time by Leimkiihler et al. [229] who prepared polycrystalline thin films of the material on different transparent conductive oxides, as well as CdTe and Mo, from uncomplexed solutions made by mixing stock solutions of SbCb, Te02, and phthalate buffer (pH 4). The electrochemical process was discussed in detail based on results obtained by cyclic voltammetry on ITO/glass. The bath temperature was found to influence... 

FIGURE 13.6 Calibration plot for hydrogen peroxide detection in flow-injection mode with nano-struc-tured Prussian blue as a detector Prussian blue electrodeposited through sol template based on the vinyltri-ethoxysilane, operating potential 50 mV, phosphate buffer pH 6.0 + 0.1M KC1, flowrate 0.7ml/min. 

Electrodeposition was used to prepare a biaxially textured Gd2Zr207 (GZO) buffer layer on Ni-W substrates.129 Buffer layers provide chemically inert, continuous, and smooth bases for the growth of the superconductor oxide films. They also prevent both the diffusion of metal to the high-temperature superconductor (HTS) layer and the oxidation of the metal substrate when superconductor oxide films are processed at high temperature (-800 °C) in an oxygen atmosphere (100ppm or more). 

Bhattacharya, R. N. Phok, S. Spagnol, P Chaudhuri, T. 2006. Electrodeposited biaxially textured buffer layer for YBa2Cu307 5 (YBCO) superconductor oxide films. J. Electrochem. Soc. 153 C273-C276. 

Cu(In,Ga)(Se,S)2 thin films prepared by electrodeposition [78] have a bandgap of approximately 2.0 eV, and demonstrate photoelectrochemical hydrogen production in 0.1 M Na2S03 in pH 10 buffer. Similar work has also been carried out using p-Culni xGaxSe2 thin film photoelectrodes in 0.5 M H2SO4 [143],... 

A working GCE coated with an electrodeposited film of CuPtCle, together with a reference SCSE and a stainless steel wire as counterelectrode, serve for sensitive amperometric determination of H2O2 in phosphate buffer at pH 7.4 in a FIA system. Working at 4-200 mV on the oxidation of the analyte avoids interference of dissolved oxygen. The response time of the coated electrode is very fast (about 5 s) the LOD is 10 nM, with linearity in the 50 nM to 5 mM range. ... 

Electrodeposition of Cd has also been reported [35, 36]. In [35], CdCl2 was used to buffer neutral chloroaluminate Hquids from which the element could be deposited. 

Fig. 4.18 Stripping oxidation peaks recorded for (a) Sn02 plus auxiliary clay (50%, 50% w/w mixture), and (b) Sn02 plus PbCOs plus auxiliary clay (20%, 40%, 40% w/w mixture) specimens attached to PlGEs in contact with 0.50 M acetate buffer. Square-wave voltammograms initiated at — 1.05 V after an electrodeposition step of 30 s at that potential. Potential step increment 4 mV square-wave amplitude 25 mV frequency 15 Hz [242]...

Voltammetric curves of the electrodeposition of [FedDTSPc]4- at a carbon-fibre electrode in pH=7.4 buffer containing 1x10 3mol I- [FedDTSPcF v=100mVs- number of scans is 25. 

Figure 3. V response of PPy/PQQ modified GC electrode to (A) phthalate buffer, and (B) 20 mM DMAET. Supporting electrolyte during electrodeposition KC1. Film thickness 132 nm.

The electrodeposition of alkaline and alkaline earth metals has been investigated in the neutral (buffered) ionic liquids for the purpose of applying the ionic liquids to electrolytes of rechargeable batteries using these metals as anodes. However, the... 

The electrodeposition of cadmium, Cd, is possible in the basic and neutral EMICI-AICI3 ionic liquids [56, 58]. In the basic ionic liquid, cadmium dichloride, CdCl2, dissolves and forms a divalent cadmium chlorocomplex anion, CdCl [69], which is reducible to metallic Cd at around — 1.2 V. In the case of a neutral buffered ionic liquid, the electrodeposition of Cd is observed at around —1.0 V, which is slightly positive than in the basic ionic liquid probably caused by the formation of more reducible species, CdCl3. ... 

Figure 31-UV- visible spectra of catalase in PBS (pH 7)phosphate buffer solution(curve a) and Cat-NiO film on ITO electrode(curve b). Reprinted from Biophysical Chemistry, 125, A.Salimi, E. Sharifi, A. NoorBakhash, S. Soltanian, Direct electrochemistry and electrocatalytic activity of catalase immobilized onto electrodeposited nano-scale islands of nickel-oxide, 542, Copyright( 2007), with permission from Elsevier.

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