Electrodeposited films

The electrodeposited film of flavin derivatives would be utilized as a functional material in combination with number dehydrogenases and pyridine coenzymes for the detection of great number of analytes. 

Fig. 3.8 XRD patterns (CuKc( source) showing a rich in selenium (x > 0.6) CdSej Tei-jt electrodeposited film, which adopts the hexagonal CdSe wurtzite structure by annealing at 520 °C (b). The as-deposited (from a typical acidic solution) film is rather amorphous (a). Segregation of a Te phase is observed in the solid. (Reprinted from Bouroushian et al. [137], Copyright 2009, with permission from Elsevier)...

Lyons LE, Morris GC, Horton DH, Keyes JG (1984) Cathodically electrodeposited films of cadmium telluride. J Electroanal Chem 168 101-116... 

Fisher JM, Berlouis LEA, Sawers LJM, MacDonald SM, Affrosman S, Diskett DJ, Astles MG (1994) Growth and characterization of electrodeposited films of cadmium telluride on silicon. J Cryst Growth 138 86-93... 

Colloidal metals, metallic sponges or blacks, skeletal metals, metal powders, evaporated metal films, electrodeposited films, wires, foils, gauzes... 

The transmission electron microscopy (TEM) images of a two-layer Tl-1223 film are shown in Fig. 7.12, which confirms the epitaxial nature of the annealed electrodeposited films. All films showed a significant amount of intergrowth, as shown by a high-resolution transmission electron microscopic (HRTEM) measurement in Figs. 7.12c and d of a representative two-layer... 

Dendritic. In electrodeposited films, dendritic grains result from mass-transport-controlled growth, and the individual crystals may vary in shape. 

Electrodeposited films almost always contain various types of inclusions or impurities. Those may be from one or more of the following origins ... 

A working GCE coated with an electrodeposited film of CuPtCle, together with a reference SCSE and a stainless steel wire as counterelectrode, serve for sensitive amperometric determination of H2O2 in phosphate buffer at pH 7.4 in a FIA system. Working at 4-200 mV on the oxidation of the analyte avoids interference of dissolved oxygen. The response time of the coated electrode is very fast (about 5 s) the LOD is 10 nM, with linearity in the 50 nM to 5 mM range. ... 

The voltammetric response of an electrodeposited film of 2 in CH2CI2 with 0.1 M TBAH is shown in Figure 6 as a representative example. A well-defined, symmetrical oxidation-reduction wave is observed, which is characteristic of surface-immobilized reversible redox couples, with the expected linear relationship of peak current with potential sweep rate A formal potential value of =+0.42... 

Nitrilotriacetate was used as complexant in the deposition in Ref. 55. Cu-Se could be both electrodeposited and chemically deposited from this solution. The electrodeposited film was Cui.sSe with the berzelianite structure, while the CD one was Cui.iSe with the umangite structure. The XRD pattern of the CD films showed sharp peaks (instrument broadening) with no preferential texture. Electron microscopy of these films (Fig. 6.2) shows large (micron scale) particles that, from their faceted shape and together with the sharp XRD peaks, appear to be single crystals. This is a particularly large crystal size for a CD film from this and... 

Consequently, it is evident that diffusion is controlling the kinetics of the process. Besides, the saturation presented at 700°C and 900°C is due to the limited amount of Ni present in the electrodeposited film. 

The earlier work, before the invention of the electron microscope, was done with homemade apparatus called electron diffraction cameras. Many important studies were made of the structures of metal foils, electrodeposits, films deposited by evaporation, oxide films on metals, and surface layers due to polishing. 

Figure 12.22 Electrolyte electroabsorption spectra for as-deposited and annealed electrodeposited films of CdTe on CdS/TCO/glass. Adapted from Duffy et al. (2000a).

Wu, B.L., Lincot, D., Vedel, J., and Yu, L.T. 1997. Voltammetric and electrogravimetric study of manganese dioxide thin film electrodes Part 1. Electrodeposited films. Journal of Electroanalytical Chemistry 420, 159-165. 

The morphology of in situ deposited PAn s using chemical oxidants is very similar to that of thin electrodeposited films. For thin films (60 nm thick), AFM studies reveal granular features of 50-100 nm in diameter that are densely packed giving smooth films.209 Thicker films are much rougher with granular features up to 200 nm in diameter. 

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