Chemical vapor deposition deposit morphology

P. Mahalingam, D. S. Dandy. Simulation of morphological instabilities during diamond chemical vapor deposition. Diamond Rel Mater d 1759, 1997. 

According to Ref. [12], template for synthesis of nanomaterials is defined as a central structure within which a network forms in such a way that removal of this template creates a filled cavity with morphological or stereochemical features related to those of the template. The template synthesis was applied for preparation of various nanostructures inside different three-dimensional nanoporous structures. Chemically, these materials are presented by polymers, metals, oxides, carbides and other substances. Synthetic methods include electrochemical deposition, electroless deposition, chemical polymerization, sol-gel deposition and chemical vapor deposition. These works were reviewed in Refs. [12,20]. An essential feature of this... 

Saita et al. [80] applied hydriding chemical vapor deposition (HCVD) for preparing MgH. They used commercial Mg, which was heated to 600°C and vaporized in a hydrogen atmosphere at a pressure of 4 MPa. The reaction product was deposited on a cooled Inconel substrate and subsequently collected for further investigation. Quite remarkably, the obtained morphology was nanofibrous, as shown in Fig. 2.47, and is very similar to the one fabricated by Zlotea et al. [79]. Each fiber was less than 1 jm in diameter and 10 or more micrometers in length. 

Chemical vapor deposition (CVD) was applied to introduce boron into Ti02 nanotubes arrays,but alteration of the morphology was observed. 

In the case of chemical vapor deposition, the solid surface is referred to as the substrate, and the gas-phase molecule is referred to as the precursor. A wide range of issues concerning the hlm-substrate interface are important in chemical vapor deposition, including structural coincidence, chemical reactivity, thermal compatibility, and substrate morphology. 

Menon, P. M., Clausing, R. E., Heatherly, L. and Feigerle, C. S. (1998), The morphology of diamond grown by hot filament chemical vapor deposition. Diam. Relat. Mater., 7(8) 1201-1206. 

Subsequent preliminary comparative studies of the behavior of an SiC based layer on Ta, Mo, Ti and steel substrates showed that better mechanical stability was obtained with a coating deposited on tantalum. This element was consequently considered to make PFCVD deposit/interlayer/steel stacks. Tantalum can be produced by physical vapor deposition (PVD), at variable thickness, with reproducible morphology. Note that preparation by chemical vapor deposition with or without plasma assistance (CVD or PECVD) is possible at low temperature but would require an optimization study in order to be compatible with the deposition conditions of the silicon carbide layer, the aim being to increase the mechanical stability. 

L. Brissoimeau and C. Vafflas, MOCVD Processed Ni Films from Nickelocene. Part I, Growth Rate and Morphology, Chemical Vapor Deposition, Vol.5,1999, pp. 135-142. 

L. Brissonneau, A. Reynes, and C. Vahlas, Morphology and Carbon Content of Nickel Films Deposited from Nickelocene, Presented at International Symposium on Chemical Vapor Deposition, CVD-XIV and EUROCVD 11, Proceedings of the Electrochemical Society, Vol.97, (No.25), 1997, pp.1580-1587. 

Xu YD, Cheng LF, Zhang LT, Zhou WC(1999) Morphology and growth mechanism of silicon carbide chemical vapor deposited at low temperature and normal atmosphere. J Mater Sci 34 551-55... 

Hong LS, Komiyama H (1991) Chemical vapor deposition of CuOx films by Cul and 02 role of cluster formation on film morphology. J Am Ceram Soc 74 1597-1604... 

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