Chemical resistance lining technology

Non-Metallic Materials Numerous engineering thermoplastics have been commercialised including materials such as polyetherether ketone (PEEK) and polyether sulphate (PES) with much improved thermal/chemical resistance. The usage of FRP equipment has increased, and fluoropolymer lining technology/applications have come of age. Of particular interest is the development of stoved, fluoropolymer coating systems for process industry equipment. 

FIGURE 2.59 Impact of Ti02 quantity on RubCon compressive strength operated in no aggressive environments (line 1), resistance coefficient (line 2), and compressive strength (line 3) after 90 days exposure to 36% solution of HC1. (Reprinted from Yu. Potapov, Yu. Borisov, V. Chmyhv, and D. Beilin, Research of Polymer Concrete Based on Low Molecular Polybutadiene, Part VIII Chemical Resistance of Polymer Concrete, J. Scientific Israel Technological Advantages 7, nos. 1-2 (2005) 72-78. With permission.)... 

The lining options for vessels have been described in Ch. 4 and reproduced here to aid our discussion. The selection of lining technology depends on several factors such as chemical resistance, material availability, vessel size, heat transfer consideration, shop versus field application, and cost (Tables... 

S. Birkle, Chemical amplification of resist lines a novel sub half micron bilayer resist technique for NUV and deep UV lithography, Proc. SPIE 1262, 528 (1990) M. Sebald, H. Berthold, M. Beyer, R. Leuschner, Ch. Ndlscher, U. Scheler, R. Sezi, H. Ahne, and S. Birkel, Application aspects of the Si CARL bilayer process, Proc. SPIE 1466, 227 237 (1991) R. Leuschner, M. Beyer, H. Bomdorfer, E. Kiihn, Ch. Nolscher, M. Sebald, and R. Sezi, CARL resist A technology for optical quarter micron resolution and below, in Proc. SPE Reg. Tech. Conf. Photopolym., Ellenville, NY, pp. 215 224(1991). 

Combustion Chemical Vapor Deposition (CCVD) allows deposition of thin films that confer special electronic, catalytic, or optical properties, corrosion and oxidation resistance. The CCVD process is a novel, open-atmosphere process that is environmentally friendly and does not require expensive reaction/vacuum chambers. Often coatings are of equal or better quality than those obtained by vacuum-based methods. Coating costs are significantly lower than for more traditional processes such as Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD). Equally important, this novel technology can be implemented in a production-line environment, thus enabling uninterrupted processing. To date over 70 different inorganic materials have been deposited onto a variety... 

The diazido-ort/io-naphthoquinone/novolac (DNQ/ novolac) photoresists have been the workhorse for the semiconductor industry for over 30 years and still continue to be the most widely used photoresists today. ° They may be utilized with different exposure wavelength technologies I-line (365 nm), G-line (436 nm), and even 248 nm. Although productivity requirements for the technology with 248 nm exposure have demanded the transfer to photoresists with a chemical amplification, the DNQ-novolac resists still remain to be the most widely used and constantly finding new areas of implementation. The modern state-of-the-art in the microdevices technology gives an opportunity to use the DNQ-novolac resists to print features as small as 0.25 In addition, these photoresists in the form... 

Rubber lining is one of the best known and proven methods employed to protect chemical process equipment against the corrosive and abrasive attacks of the fluids. One of the most important characteristics of both natural rubber and synthetic rubber is the remarkable resistance to corrosive chemicals, fumes, acids, alkalies and other salt solutions. Without protection, corrosion would be so extensive that most products of modern technology could not exist. The variations and large percentages of corrosive impurities have little influence on the rubber lining up to temperatures as high as 100 °C to 120 °C. 

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