Ceramic titanium nitride

Ceramics Titanium nitride, zirconium nitride Anti-wear coating of femoral balls and knee prostheses, coating for coronary stents Bioinert Staia et al. (1995)... 

Figure 32.3 Intensity profiles of Ti and Al in a ceramic titanium nitride (TiN) membrane having an AI2O3 support. The profiles are scanned along the dotted line (Tomandl et al., 2000, with permission from Elsevier).

Ceramic-coated disposable inserts, including silicon nitride, boron nitride, titanium nitride (TIN), titanium carbide (TIC) and sintered synthetic diamond ... 

Titanium nitride is a truly inert ceramic barrier, which is effective to 550°C. It is deposited by MOCVD or sputtering (see Ch. 10). 

Jiang, L. and L. Gao, Fabrication and characterization of carbon nanotube-titanium nitride composites with enhanced electrical and electrochemical properties. Journal of the American Ceramic Society, 2006. 89(1) p. 156-161. 

A variety of other ceramics are prepared by pyrolysis of preceramic polymers.32,38 Some examples are silicon carbide, SC, tungsten carbide, WC, aluminum nitride, AIN, and titanium nitride, TiN. In some cases, these materials are obtained by simple pyrolysis in an inert atmosphere or under vacuum. In other cases a reactive atmosphere such as ammonia is needed to introduce some of the atoms required in the final product. Additional details are given in Chapter 9. 

Recent research has explored a wide variety of filler-matrix combinations for ceramic composites. For example, scientists at the Japan Atomic Energy Research Institute have been studying a composite made of silicon carbide fibers embedded in a silicon carbide matrix for use in high-temperature applications, such as spacecraft components and nuclear fusion facilities. Other composites that have been tested include silicon nitride reinforcements embedded in silicon carbide matrix, carbon fibers in boron nitride matrix, silicon nitride in boron nitride, and silicon nitride in titanium nitride. Researchers are also testing other, less common filler and matrix materials in the development of new composites. These include titanium carbide (TiC), titanium boride (TiB2), chromium boride (CrB), zirconium oxide (Zr02), and lanthanum phosphate (LaP04). 

Eslamloo-Grami, M., and Munir, Z. A., Effect of porosity on the combustion synthesis of titanium nitride. J. Am. Ceram. Soc., 73, 1235 (1990a). 

Mechanochemical processing has been used to manufacture nanocrystalline powders of nitride and carbide ceramics. The majority of systems involve milling of the metal precursor with a source of carbon or nitrogen. The source of carbon or nitrogen has typically taken the form of the element itself. However, a variety of other reagents have also been used. For example, Zhang et al. reported the synthesis of titanium nitride by milling titanium metal with pyrazine in a benzene solution. 

Numerous ceramics are deposited via chemical vapor deposition. Oxide, carbide, nitride, and boride films can all be produced from gas phase precursors. This section gives details on the production-scale reactions for materials that are widely produced. In addition, a survey of the latest research including novel precursors and chemical reactions is provided. The discussion begins with the mature technologies of silicon dioxide, aluminum oxide, and silicon nitride CVD. Then the focus turns to the deposition of thin films having characteristics that are attractive for future applications in microelectronics, micromachinery, and hard coatings for tools and parts. These materials include aluminum nitride, boron nitride, titanium nitride, titanium dioxide, silicon carbide, and mixed-metal oxides such as those of the perovskite structure and those used as high To superconductors. 

Buiting Ml, Reader AH (1990) Influence of impurityes and micro structure on the resistivity of LPCVD titanium nitride films. In Besmann TM, Gallois BM (eds) Chemical vapour deposition of refractory metals and ceramics. Materials Research Society, Pittsburgh, PA, ppl 99-204... 

A large number of important ceramics adopt the halite (NaCl, Bl) structure (Section 5.3.9). These include the oxides magnesium oxide (MgO) and nickel oxide (NiO) and many carbides and nitrides with a formula MX, such as titanium carbide (TiC) and titanium nitride (TiN). The oxides are often considered as ionic solids. The carbides and nitrides have metallic properties. 

Hard ceramic surface coatings on metalhc components can be made by heating the metal in an appropriate gaseous atmosphere. Reaction takes place at the metal surface and atoms from the gaseous component diffuse into the surface layer. Thus, if titanium is heated in nitrogen gas a layer of titanium nitride (TIN) will form on the surface as a hard layer. 

AI2O3 is often used to provide a ceramic material in contact with the workpiece or to apply several multilayers of the type Al203/TiN. The thicknesses of the sublayers are on the order of about 1 pm and the total layer thickness is about 10-12 pm. Such a structure is shown in Fig. 29 for the WIDIA grade TNI 50. Most of these layers are deposited by CVD. Also a combination of PVD and CVD ( duplex ) techniques was studied and has yielded better performing layers than other titanium nitride and carbonitride coatings [110]. 

A cermet is a composite material composed of ceramic particles including titanium carbide (TiC), titanium nitride (TiN), and titanium carbonitride (TiCN) bonded with metal. The name cermet combines the words ceramic (cer) and metal (met). They are most successfully used for finishing and light roughing applications. 

Reaction-bonded titanium nitride (RBTN) ceramics are like RBSN made from a porous green shape of titanium powder that is reacted with nitrogen to titanium nitride (TiN) at temperatures up to 1000°C. Here the titanium hardly increases in molar volume when nitrided and the initial porosity remains the same but the gas permeability of a pressed titanium tablet is increased after it has been converted to titanium nitride. If the titanium powder particles are too large, the reaction stops after passivation of the metal surfaces the TiN formed at the surface is a diffusion barrier that stops the reaction. A fractal powder morphology of the starting metal (such as can be obtained from gas-phase preparation) is a very suitable reactant for complete reaction at modest temperatures. 

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