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Boundary layer, electronic

Besides the expressions for a surface derived from the van der Waals surface (see also the CPK model in Section 2.11.2.4), another model has been established to generate molecular surfaces. It is based on the molecular distribution of electronic density. The definition of a Limiting value of the electronic density, the so-called isovalue, results in a boundary layer (isoplane) [187]. Each point on this surface has an identical electronic density value. A typical standard value is about 0.002 au (atomic unit) to represent electronic density surfaces. [Pg.129]

Fig. 3. An overview of atomistic mechanisms involved in electroceramic components and the corresponding uses (a) ferroelectric domains capacitors and piezoelectrics, PTC thermistors (b) electronic conduction NTC thermistor (c) insulators and substrates (d) surface conduction humidity sensors (e) ferrimagnetic domains ferrite hard and soft magnets, magnetic tape (f) metal—semiconductor transition critical temperature NTC thermistor (g) ionic conduction gas sensors and batteries and (h) grain boundary phenomena varistors, boundary layer capacitors, PTC thermistors. Fig. 3. An overview of atomistic mechanisms involved in electroceramic components and the corresponding uses (a) ferroelectric domains capacitors and piezoelectrics, PTC thermistors (b) electronic conduction NTC thermistor (c) insulators and substrates (d) surface conduction humidity sensors (e) ferrimagnetic domains ferrite hard and soft magnets, magnetic tape (f) metal—semiconductor transition critical temperature NTC thermistor (g) ionic conduction gas sensors and batteries and (h) grain boundary phenomena varistors, boundary layer capacitors, PTC thermistors.
Processing variables that affect the properties of the thermal CVD material include the precursor vapors being used, substrate temperature, precursor vapor temperature gradient above substrate, gas flow pattern and velocity, gas composition and pressure, vapor saturation above substrate, diffusion rate through the boundary layer, substrate material, and impurities in the gases. Eor PECVD, plasma uniformity, plasma properties such as ion and electron temperature and densities, and concurrent energetic particle bombardment during deposition are also important. [Pg.525]

In 1979, a viable theory to explain the mechanism of chromium electroplating from chromic acid baths was developed (176). An initial layer of polychromates, mainly HCr3 0 Q, is formed contiguous to the outer boundary of the cathode s Helmholtz double layer. Electrons move across the Helmholtz layer by quantum mechanical tunneling to the end groups of the polychromate oriented in the direction of the double layer. Cr(VI) is reduced to Cr(III) in one-electron steps and a colloidal film of chromic dichromate is produced. Chromous dichromate is formed in the film by the same tunneling mechanism, and the Cr(II) forms a complex with sulfate. Bright chromium deposits are obtained from this complex. [Pg.143]

He solved this equation, using three different boundary conditions, two of which are also used in the field of particle deposition on collectors the Perfect Sink (SINK) model, the Surface Force Boundary Layer Approximation (SFBLA) and the Electrode-Ion-Particle-Electron Transfer (EIPET) model. [Pg.215]

This Gouy-Chapman-Stern model, as it was named after its main contributors, is a highly simplified model of the interface, too simple for quantitative purposes. It has been superseded by more realistic models, which account for the electronic structure of the metal, and the existence of an extended boundary layer in the solution. It is, however, still used even in current publications, and therefore every electrochemist should be familiar with it. [Pg.229]

The removal of an electron from an acceptor level or a hole from a donor level denotes, as we have seen, not the desorption of the chemisorbed particle but merely its transition from a state of strong to a state of weak bonding with the surface. The neglect of this weak form of chemisorption (i.e., electrically neutral form) which is characteristic of all papers on the boundary-layer theory of adsorption makes it quite impossible to depict the chemisorbed particle in terms of an energy level, i.e., to apply the energy band scheme depicted in Fig. 10 and used in these papers. ... [Pg.211]

This effect is characterized by light-induced formation of a photo-emf in boundary layer-free systems 8>10>. It is necessary for the generation of the Dember emf to have (a) the formation of a concentration gradient of charge carriers resulting from non-uniform illumination, and (b), electrons and holes of different mobilities ... [Pg.94]

Though there is fluid flow in the bulk of the electrolyte, it is found that there is a layer adjacent to the electrode in which the electrolyte is stationary, or stagnant. Thus the electron acceptors travel by convection from the bulk up to the stagnant layer and then cross the remaining boundary layer by diffusion. This transport by a convection-with-diffusion mechanism has not been taken into account so far. The equations for the time and space variation of concentration [i.e., Eq. (7.178)], for the transition time [Eq. (7.190)], and for the time variation of potential [Eq. (7.192)] have been derived for convection-free conditions, and they break down when convection becomes significant. The first approximation theory given above, therefore, deviates from experiment if the constant current is applied sufficiently long (times on the order of seconds) for convection to be important. [Pg.509]

Fig. 2. Diagram for the chemical potential n, electrochemical potential j, and electrical potential Fig. 2. Diagram for the chemical potential n, electrochemical potential j, and electrical potential <fi, in the interior (H) and in the boundary layer (R) of an n- and p-conducting oxide due to chemisorption of oxygen, according to Engell and Hauffe. This chemisorption consumes electrons.
Here and are the concentrations of free electrons and of electron holes in the boundary layer (72), respectively, and the index (surface phase. Whereas at certain temperatures we may have mainly 0 ions chemisorbed, the process... [Pg.220]

Fig. 3. Scheme of the distribution of the concentration of free electrons n , interstitial metal ions JiMeO (Fig. 3a), electron holes n and metal ion vacancies UMeO (Fig. 3b), in the boundary layer and in the interior of n- and p-conducting solids respectively, according to Engell and Hauffe. Here I is the critical thickness of the boundary layer. [Pg.222]

A similar expression is to be expected for the distribution of electrons in exhaustion boundary layers. The evaluation of these equations is not easy. Therefore, it is desirable to simplify our assumptions concerning the distribution of the electrons and holes in the boundary layer. This simplification is illustrated by Fig. 3. With a suitable choice of the thickness I of the boundary layer, the simplification will satisfactorily approximate the real case. The distribution of space charge in an inundation boundary layer can be similarly calculated, and will be shown below in parentheses. [Pg.223]

The simplification applies for eVd kT, in which case r n (or i.e. the concentration of free electrons in the boundary layer, is negligibly small in the case of an w-type oxide with an... [Pg.223]

Since, in the first approximation, every oxygen atom captures one electron, the number of surface charges equals the total number of ionized defects in the boundary layer having a density equal to R ") (or the number of additional electron holes in the boundary layer produced by chemisorption) the surface concentration of chemisorbed oxygen atoms (gram atoms per square centimeter) is therefore... [Pg.223]

Thereby, the concentration of the electron holes in the boundary layer of CU2O will be decreased. The chemisorption of H2O destroys the inundation boundary layer of CU2O, produced by the preceding chemisorption of oxygen originally present after contact with air... [Pg.225]

The remaining concentration of electron holes and, therefore, the electrical conductivity are functions of the water vapor pressure. This function can be derived by applying the formula (15a) of the exhaustion boundary layer. There we have, however, to substitute for Using the law of mass action of (21), we obtain for the diffusion potential... [Pg.226]

Ljaschenko and Stepko have studied the decrease of the electrical conductivity of very thin CU2O films after these films had chemisorbed methyl alcohol, ethyl alcohol, acetone, and water vapor. Engell (18) has explained this decrease of conductivity by extending the explanation given above to the chemisorption on thin films whose total thickness is less than the thickness of the boundary layer. If is the conductivity before the chemisorption of any of the vapors listed above, the mean longitudinal conductivity after the chemisorption has taken place, and ifiH) then Ak is proportional to the number of the electron... [Pg.227]

The formation of boundary layers at the surface interface between semiconductor and gas influences also the luminescence and the electro-optical qualities of semiconductors. These effects offer interesting possibilities for studying experimentally the mechanism of chemisorption, the stationary state of chemisorption, and electron defects in the catalyst during catalysis. Experiments along this line have been carried out by some investigators (40,41) who have studied in a qualitative way the factors influencing the oxidation of phenols catalyzed by zinc oxide under the influence of light. Further work on this subject is desirable. [Pg.230]

Finally, we must consider the contribution of the electrostatic work required to transfer one electron into free space. After overcoming the short range chemical forces, the electron must be moved a certain distance against the electric field in the surface. Under the assumption that the lines of force of the electric field are located between the ion defects in the boundary layer and the surface charges represented by the chemisorbed gas atom, we obtain the expression afi for this electrostatic work term. is the boundary field strength represented in Equation (11), and a is the distance between the surface of the oxide and the centers of charge of the chemisorbed atoms in the a-phase. [Pg.231]

Let us consider the mechanism of the decomposition of N2O on p- and n-conducting oxides. The first step of the decomposition of N 2O is always the chemisorption of N2O, or of oxygen derived from N2O. In the case of a p-type oxide (e.g., NiO), the number of electron holes in the boundary layer will be increased as a result of the chemisorption of N2O as follows... [Pg.237]


See other pages where Boundary layer, electronic is mentioned: [Pg.495]    [Pg.233]    [Pg.285]    [Pg.872]    [Pg.11]    [Pg.11]    [Pg.138]    [Pg.653]    [Pg.1006]    [Pg.217]    [Pg.392]    [Pg.146]    [Pg.211]    [Pg.259]    [Pg.372]    [Pg.350]    [Pg.72]    [Pg.219]    [Pg.219]    [Pg.220]    [Pg.221]    [Pg.222]    [Pg.223]    [Pg.224]    [Pg.228]    [Pg.228]    [Pg.234]    [Pg.237]   
See also in sourсe #XX -- [ Pg.72 , Pg.219 , Pg.262 , Pg.272 ]




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