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Polish additives

Partial recycling of treated water after biological treatment will usually require additional polishing (tertiary treatment). This may include chemical addition, flocculation, and DAF. This is BAT according to the EC.38... [Pg.895]

A two- or three-stage RO system will usually remove about 96% to 98% of the total dissolved solids (TDS) in the water. The effluent water quality is generally high enough to send to low- to medium-pressure boilers without additional polishing. However, each application and feed water is different, and, therefore, water sampling and design projections should be conducted for every application to determine what the projected water quality will be (see Chapters 7 and 10). [Pg.89]

If one deducts the approximately 1 million unregistered emigrants from the 5.3 to 6 million victims that Benz claims he found, this leaves him with 4.3 to 5 million victims. From this, one must further deduct the difference between the Soviet Jews who appeared in Soviet statistics and the real number (some 1.5 million), the number of Jews who died in the Soviet Union from other causes (deportation, war, partisan warfare, at least 500,000), the number of statistically fabricated additional Polish Jews (some 700,000) as well as the number of Hungarian Jews who probably did not succumb in their entirety (300,000), in other words, a total of roughly 4 million. This would leave Benz with a remainder of at most 1.3 to 2 million unsolved cases. [Pg.204]

Evaporation is a widely used method for radioactive waste processing. One of disadvantages of the process is radionuclides carry over with small droplets. The contaminated condensate needs additional polishing with ion-exchange resins. The installation of MD module for final cleaning of the condensate can avoid the use of ion exchange. The unit that plays the role of demister can be driven with waste heat from nuclear power plant. [Pg.872]

In the subsequent manufacturing process, it was decided to proof test component windows in a biaxial flexure test in air to eliminate specimens that had flaws bigger than 500 xm. Windows that survived were given an additional polish so that the machining flaws were reduced to values between 1 and 10 xm. Complete the following tasks, explaining your approach and indicating clearly any assumptions you have made (justify). [Pg.310]

Membrane processes are versatile and flexible they can be combined with other methods in hybrid processes. Adapted to actual needs, they can treat various process streams of different compositions and concentrations. MD coupled with EV or RO may improve the purification efficiency and increase DFs. The flow chart of such hybrid processes is presented in Figure 25.21. In Figure 25.21a, the combination of MD unit with evaporator is shown. EV is a widely used method for radioactive waste processing. One of the disadvantages of the process is radionuclides carry over with small droplets. The contaminated condensate needs additional polishing with IX resins. The installation of MD module for the final cleaning of the condensate can avoid the use of IX. The unit that plays the role of demister can be driven with waste heat from nuclear power plant. [Pg.691]

The thin films formed from dilute dispersions of NFC had a more dense structure and were optically translucent the transparency value of the films at wavelength of 600 nm was about 72%. After additional polishing the transmittance of NFC films was improved and reached 78—90%. [Pg.265]

The economy of the process is usually determined by the value of the recovered substances. Emission regulations in all industrial countries demand very low final concentrations if the gas stream is released to the atmosphere, therefore the retentate from the gas purification by the membrane is either recycled to the upstream process or further treated by an additional polishing step. [Pg.188]

Figure 79. Glass surfaces after additional polishing with cerium oxide of grain size 2 pm, DIG. Figure 79. Glass surfaces after additional polishing with cerium oxide of grain size 2 pm, DIG.
Uses Release agent antifoam hydraulic fluid surfactant lubricant cosmetics/per-sonal care additive polish and specialty chem. elec7electronics equip. food processing... [Pg.1819]


See other pages where Polish additives is mentioned: [Pg.891]    [Pg.136]    [Pg.856]    [Pg.178]    [Pg.677]    [Pg.869]    [Pg.24]    [Pg.69]    [Pg.70]    [Pg.108]    [Pg.48]    [Pg.122]    [Pg.853]    [Pg.270]   
See also in sourсe #XX -- [ Pg.826 ]




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