3D lithography

Perry JW, Ananthavel S, Carmmack K, Kuebler SM, Marder SR, Rumi M, Cumpston BH, Heikal AA, Ehrlich JE, Erskine LL, Levin MD (1999) Materials for two-photon 3D lithography. In Organic thin films for photonics applications. Optical Society of America, Washington DC,p 174... 

Other commercial lithography simulators of note include Solid, which was developed by Wolfgang Hencke of the Fraunhofer Institute in 1991. Solid was the first 3D lithography simulator. It was first commercialized in 1992 by Silvaco, but subsequently was released in 1994 as SOLID-C by SIGMA-C. ... 

Keywords 3D lithography Two-photon photopolymerization Femtosecond laser Micro-nanodevice Micro-nanofabrication... 

In two-photon 3D lithography, the nominal Gaussian output of the laser underwent beam expansion and focusing, and was spatially filtered, producing a relatively flat wave front. Light distribution at the focal plane arises essentially from Fraunhoffer diffraction on the aperture of an objective lens [126], of which the diffraction pattern is shown by the inset of Fig. 18. 

The field of laser lithography (also often called laser microfabrication) branched out from multiphoton excitation microscopy and has become established during the last decade. The principles of two-photon microscopy, which has enabled high-resolution 3D imaging [3,4] and optical memory [5], were gradually adapted for 3D laser hthography [6]. A relevant collection of seminal papers on the field can be found in [7]. 

Expressions accounting for the nonlinear absorption, which is the main mechanism enabling 3D laser lithography, can be easily obtained by assuming the photomodification to be dependent on the intensity as a... 

Among the mechanisms of nonlinear absorption, TPA is the most important and widely used for 3D laser lithography in resists and resins. TPA requires smaller incident powers than higher-order processes, for example multipho-... 

D Systems Inc., Valencia, CA, u.S.A. Stereo lithography Apparatus (SLA) Photopolymer system point-by-point irradiation with a HeCd resp. an argon ion laser... 

Soft Lithography Lithography is essentially a process for printing features on a planar surface. Nanolithography tools, commonly referred to as soft lithography, allow precisely defined nanoscale features to be produced on a substrate, which can be removed from the substrate as free-standing 3D nano-objects. A number of techniques fall within the field of soft lithography, primarily for construction of micrometer-sized objects ... 

Colloidal lithography allows for fabrication of advanced structures, such as 3D structures similar to those shown in Fig. 4.4. Here, we describe three different strategies to make advanced Pt/ceria structures. 

Lithography steps are followed by a number of subtractive and additive processes, transferring the lithography patterns into ICs or 3D micromachines. Table 3.2 is a partial list of subtractive steps used in building microstructures. In subtractive processes material is removed from the device under construction, usually very selectively, through the use of a resist or other mask pattern (e.g. an oxide or a nitride). 

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