3D laser lithography

Expressions accounting for the nonlinear absorption, which is the main mechanism enabling 3D laser lithography, can be easily obtained by assuming the photomodification to be dependent on the intensity as a... 

Among the mechanisms of nonlinear absorption, TPA is the most important and widely used for 3D laser lithography in resists and resins. TPA requires smaller incident powers than higher-order processes, for example multipho-... 

The field of laser lithography (also often called laser microfabrication) branched out from multiphoton excitation microscopy and has become established during the last decade. The principles of two-photon microscopy, which has enabled high-resolution 3D imaging [3,4] and optical memory [5], were gradually adapted for 3D laser hthography [6]. A relevant collection of seminal papers on the field can be found in [7]. 

D Systems Inc., Valencia, CA, u.S.A. Stereo lithography Apparatus (SLA) Photopolymer system point-by-point irradiation with a HeCd resp. an argon ion laser... 

Micro stereo lithography is a rapid prototyping method to generate 3D molds. It is a maskless process with layer-by-layer fabrication of microstructures via the projection of sliced images of 3D objects, as shown in Fig. 9. A laser beam directs to the photocurable resin which can be classified as an epoxy, vinylether, or acrylate. The 3D structure or mold is built on a platform which can be controlled by an XYZ positioner. When one layer is complete, the plat-... 

Keywords 3D lithography Two-photon photopolymerization Femtosecond laser Micro-nanodevice Micro-nanofabrication... 

In two-photon 3D lithography, the nominal Gaussian output of the laser underwent beam expansion and focusing, and was spatially filtered, producing a relatively flat wave front. Light distribution at the focal plane arises essentially from Fraunhoffer diffraction on the aperture of an objective lens [126], of which the diffraction pattern is shown by the inset of Fig. 18. 

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