Patterning lithography

Microdrawing techniques of stacked capillaries are mainly used to manufacture optical elements. Nanochannel glass has been used to produce a mask, which was applied in massive parallel patterned lithography (Tonucci et al., [522,523]). Multi-microcapillary systems are also used in optical applications, for instance, to focus X-ray beams [553]. Beloglazov et al. [41] described that apart in X-ray optics drawn stacked microcapillaries have foimd applications as parts of microactuators used in micromechanics, filters in bio and medicine technical applications, light guiding elements and photonic crystals and also for visualisation systems in electronics. 

Optical Lithography. Optical Hthography uses visible or ultraviolet light as the exposure media, and is the dominant Hthographic process used for patterning IC wafers. The linewidth limit is near 0.4 p.m, although some narrower features may be possible (34). The masks typically are made from patterned, opaque chromium films on glass. 

Nanomaterials can be manufactured by one of two groups of methods, one physical and one chemical. In top-down approaches, nanoscale materials are carved into shape by the use of physical nanotechnology methods such as lithography (Fig. 15.30). In bottom-up approaches, molecules are encouraged to assemble themselves into desired patterns chemically by making use of specific... 

Preliminary experiments with electron-beam writing and ion-beam projection lithography have demonstrated that the S-layer may also be patterned by these techniques in the sub-lOO-nm range (nnpnblished resnlts). The combination of ion-beam projection lithography and S-layers as resist might become important in the near fntnre, since ion beams allow the transfer of smaller featnres into S-layer lattices compared to optical lithography. 

Includes Pattern generator, photo-repeater, electron-beam lithography and contact printer... 

Contact lithography can be used to spatially control the photosubstitution process to form laterally resolved bicomponent films with image resolution below 10 pm. Dramatic changes occur in the colors and redox potentials of such ruthenium(II) complexes upon substitution of chloride for the pyridine ligands (Scheme 1). Striped patterns of variable colors are observed on addressing such films with a sequence of potentials. 

FIGURE 15.4 SEM images of vertically aligned MWNTs at (left) UV lithography and at (right) e-beam patterned Ni spots. (Reprinted with permission from [45]. Copyright (2003) American Chemical Society.)... 

Park, J. D. Lee, K. D. 2007. Method for manufacturing stamp for nanoimprint lithography having two-dimensional pattern of uniform size and shape, and method for photonic crystal using the same. LG Electronics Inc., S. Korea. 

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