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Volatile impurities

Volatile impurities, eg, F2, HF, CIF, and CI2, in halogen fluoride compounds are most easily deterrnined by gas chromatography (109—111). The use of Ftoroplast adsorbents to determine certain volatile impurities to a detection limit of 0.01% has been described (112—114). Free halogen and haHde concentrations can be deterrnined by wet chemical analysis of hydrolyzed halogen fluoride compounds. [Pg.187]

The concentration of aqueous solutions of the acid can be deterrnined by titration with sodium hydroxide, and the concentration of formate ion by oxidation with permanganate and back titration. Volatile impurities can be estimated by gas—Hquid chromatography. Standard analytical methods are detailed in References 37 and 38. [Pg.505]

In most cases, the activator impurity must be incorporated during crystal growth. An appropriate amount of impurity element is dissolved in the molten Ge and, as crystal growth proceeds, enters the crystal at a concentration that depends on the magnitude of the distribution coefficient. For volatile impurities, eg, Zn, Cd, and Hg, special precautions must be taken to maintain a constant impurity concentration in the melt. Growth occurs either in a sealed tube to prevent escape of the impurity vapor or in a flow system in which loss caused by vaporization from the melt is replenished from an upstream reservoir. [Pg.435]

Electron-beam melting of zirconium has been used to remove the more volatile impurities such as iron, but the relatively high volatiUty of zirconium precludes effective purification. Electrorefining is fused-salt baths (77,78) and purification by d-c electrotransport (79) have been demonstrated but are not in commercial use. [Pg.431]

Redistillation. For certain appHcations, especially those involving reduction of other metal compounds, better than 99% purity is required. This can be achieved by redistillation. In one method, cmde calcium is placed in the bottom of a large vertical retort made of heat-resistant steel equipped with a water-cooled condenser at the top. The retort is sealed and evacuated to a pressure of less than 6.6 Pa (0.05 mm Hg) while the bottom is heated to 900—925°C. Under these conditions calcium quickly distills to the condensing section leaving behind the bulk of the less volatile impurities. Variations of this method have been used for commercial production. Subsequent processing must take place under exclusion of moisture to avoid oxidation. [Pg.401]

Polymerization-grade chloroprene is typically at least 99.5% pure, excluding inert solvents that may be present. It must be substantially free of peroxides, polymer [9010-98-4], and inhibitors. A low, controlled concentration of inhibitor is sometimes specified. It must also be free of impurities that are acidic or that will generate additional acidity during emulsion polymerization. Typical impurities are 1-chlorobutadiene [627-22-5] and traces of chlorobutenes (from dehydrochlorination of dichlorobutanes produced from butenes in butadiene [106-99-0]), 3,4-dichlorobutene [760-23-6], and dimers of both chloroprene and butadiene. Gas chromatography is used for analysis of volatile impurities. Dissolved polymer can be detected by turbidity after precipitation with alcohol or determined gravimetrically. Inhibitors and dimers can interfere with quantitative determination of polymer either by precipitation or evaporation if significant amounts are present. [Pg.39]

Tri-p-tolyl phosphate [20756-92-7, 1330-78-5 (isomeric tritolyl phosphate mixture)] M 368.4, b 232-234 , d 1.16484, n 1.56703. Dried with CaCl2, then distd under vacuum and percolated through a column of alumina. Passage through a packed column at 150°, with a counter-current stream of nitrogen, under reduced pressure, removed residual traces of volatile impurities. [Pg.495]

The principal constituents of the paniculate matter are lead/zinc and iron oxides, but oxides of metals such as arsenic, antimony, cadmium, copper, and mercury are also present, along with metallic sulfates. Dust from raw materials handling contains metals, mainly in sulfidic form, although chlorides, fluorides, and metals in other chemical forms may be present. Off-gases contain fine dust panicles and volatile impurities such as arsenic, fluorine, and mercury. [Pg.132]

Large quantities of solvents are employed for sample preparation, in particular, and these are then concentrated down to a few milliliters. So particularly high quality materials that are as free as possible from residual water and especially free from nonvolatile or not readily volatile impurities ought to be employed here such impurities are enriched on concentration and can lead to gross contamination. The same considerations also apply to preparative chromatography. Special solvents of particular purity are now available. [Pg.121]

Scrap iron to reduce Fe 1 Treat with H2S or oil to reduce the volatile impurity, VCXTU... [Pg.960]

The lack of significant vapor pressure prevents the purification of ionic liquids by distillation. The counterpoint to this is that any volatile impurity can, in principle, be separated from an ionic liquid by distillation. In general, however, it is better to remove as many impurities as possible from the starting materials, and where possible to use synthetic methods that either generate as few side products as possible, or allow their easy separation from the final ionic liquid product. This section first describes the methods employed to purify starting materials, and then moves on to methods used to remove specific impurities from the different classes of ionic liquids. [Pg.17]

Volatile impurities in an ionic liquid may have different origins. They may result from solvents used in the extraction steps during the synthesis, from unreacted starting materials from the allcylation reaction (to form the ionic liquid s cation), or from any volatile organic compound previously dissolved in the ionic liquid. [Pg.24]

In theory, volatile impurities can easily be removed from the nonvolatile ionic liquid by simple evaporation. However, this process can sometimes take a considerable time. Factors that influence the time required for the removal of all volatiles from an ionic liquid (at a given temperature and pressure) are a) the amount of volatiles, b) their boiling points, c) their interactions with the ionic liquid, d) the viscosity of the ionic liquid, and e) the surface of the ionic liquid. [Pg.24]

A typical example of a volatile impurity that can be found as one of the main impurities in low-quality ionic liquids with alkylmethylimidazolium cations is the methylimidazole starting material. Because of its high boiling point (198 °C) and its strong interaction with the ionic liquid, this compound is very difficult to remove from an ionic liquid even at elevated temperature and high vacuum. It is therefore important to make sure, by use of appropriate allcylation conditions, that no unreacted methylimidazole is left in the final product. [Pg.24]

When separating a volatile product from volatile impurities, batch distillation is usually best. [Pg.19]

All non-volatile impurities entering the boiler must build up in the boiler water. This includes the TDS in the feed, plus most of the conditioning chemicals, of which the... [Pg.477]

The aqueous alkaline extract is heated to ioo° to remove ether and volatile impurities. The solution is then cooled with ice and acidified with 25 per cent sulfuric acid, and the organic acid separated. The water layer is distilled from a 2-1. flask until no more oily solution comes over, The distillate is saturated with salt and the acid layer is separated. This water layer together with the low boiling fraction from distillation of the crude trimethylacetic acid is distilled and the distillate salted out as before. [Pg.105]

Sublimation. This process is employed to separate volatile substances from non-volatile impurities. Iodine, arsenic(III) oxide, ammonium chloride and a number of organic compounds can be purified in this way. The material to be purified is gently heated in a porcelain dish, and the vapour produced is condensed on a flask which is kept cool by circulating cold water inside it. [Pg.106]

The reaction of Na with Hg to form an amalgam that can then be separated from the NajO for oxygen analysis has been compared with the vacuum distillation technique . Ion-exchange techniques in which the sample is dissolved in a suitable solvent and the resulting separation of elements is achieved by an ion-exchange resin is less common. This technique is particularly suited to separating the volatile impurities such as K, Rb and Co. ... [Pg.337]

Multicycle vacuum distillations have been assessed ". The distillations were effected at 700°C. Data on the effect of distillation rate and of fraction distilled on the purity of the sample are collected in Table 1. These data show that the technique is effective in removing the less volatile impurities As, Co, Cu, Cr, Fe, Ga, Mn and Sb from Mg but has little effect on more volatile species, Ba, Zn and Zr. Increase of the distillation rate or the fraction distilled leads to a decrease in the effective purification. Double (99% fraction) distillation gives a product of similar purity to that of a single (72% fraction) distillation . Single (78% fraction) distillation of a Mg sample (assay 99.9%) unusually rich in Mn (300 fig g" ) at 3.5 g h gave a decrease (Xl0 ) in Mn content (to 0.025 fig g ) a similar value (0.04 fig g" ) was obtained from a doubly (99% fraction) distilled sample. This technique gives Mg with assays of 99.9995%... [Pg.373]


See other pages where Volatile impurities is mentioned: [Pg.359]    [Pg.1029]    [Pg.245]    [Pg.230]    [Pg.360]    [Pg.516]    [Pg.523]    [Pg.527]    [Pg.560]    [Pg.291]    [Pg.150]    [Pg.448]    [Pg.401]    [Pg.201]    [Pg.29]    [Pg.148]    [Pg.284]    [Pg.404]    [Pg.430]    [Pg.432]    [Pg.485]    [Pg.136]    [Pg.155]    [Pg.766]    [Pg.370]    [Pg.312]    [Pg.327]    [Pg.337]    [Pg.338]    [Pg.364]   
See also in sourсe #XX -- [ Pg.179 , Pg.182 , Pg.341 ]




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Non-volatile Impurities in the Surface

Non-volatile impurities

Organic volatile impurities

Organic volatile impurities (OVI

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