Titanium nitride properties

Titanium nitride (TiN) is an important industrial material used extensively as a CVD coating. Its characteristics and properties are summarized in Table 10.7. 

In devices with geometry below the 0.25 im level, titanium nitride will likely replace titanium-tungsten, since it has better barrier properties. The process of choice will likely be CVD, which offers improved uniformity and step coverage, although improvements in collimated sputtering may keep that process on line for a while. 

Syntheses and Catalytic Properties of Titanium Nitride Nanoparticles... 

This reduction can also be carried out with molecular hydrogen and as such is probably not of any commercial interest. However, it is suited for the study of the catalytic properties of the ultrafine powders and serves as a characterization and optimization technique for the titanium nitride nanoparticles in this study. 

Jiang, L. and L. Gao, Fabrication and characterization of carbon nanotube-titanium nitride composites with enhanced electrical and electrochemical properties. Journal of the American Ceramic Society, 2006. 89(1) p. 156-161. 

The studied coats based on titanium have partly semiconductor and partly metallic properties. The concentration of the free carriers is around 1019c j 3 i.e. greatly (three orders) less than in metal, but also 3-4 orders more than in semiconductors. The Fermi level in titanium nitride is located in the minimum of the state density formed by intersection of titanium d-zone and p-zone of nitrogen [5] (Fig. 8). Therefore such coats are offered as the most perspective thin-film defensive covering. 

Ternary phases with structures different from those of the phases of the binary boundary systems are more the exception than the rule. Such phases have been reported in the systems Nb-Mo-N, Ta-Mo-N, Nb-Ta-N, Zr-V-N, Nb-Cr-N, and Ta-Cr-N. Information about ternary transition metal-nitrogen systems is often available for specific temperatmes only. This is even more the case for quaternary nitride systems, which play a role in the production of carbonitride cermets where quaternary compounds of the types (Ti,Mo)(C,N) and (Ti,W)(C,N) are of interest (see Carbides Transition Metal Solid-state Chemistry), as well as in layer technology where titanium nitride-based coatings of the type Ti(C,B,N) are prepared by magnetron sputtering. Layers consisting of ternary compounds of the type (Ti,Al)N and (Ti,V)N also have favorable properties with respect to abrasion resistance. 

Partch, R.E. et al.. Preparation and properties of uniform coated colloidal particles. Vin. Titanium nitride on silica, J. Mater. Res., 8, 2014. 1993. 

A large number of important ceramics adopt the halite (NaCl, Bl) structure (Section 5.3.9). These include the oxides magnesium oxide (MgO) and nickel oxide (NiO) and many carbides and nitrides with a formula MX, such as titanium carbide (TiC) and titanium nitride (TiN). The oxides are often considered as ionic solids. The carbides and nitrides have metallic properties. 

Various preparation methods have been employed to dope nitrogen into T1O2 either based on chemical reactivity (sol-gel synthesis, chemical treatments of the bare oxide, oxidation of titanium nitride, etc.) or on physical methods (ion implantation, magnetron sputtering) [16], These different procedures lead, at least in some cases, to materials with somewhat different chemical and physical properties. In addition to the preparation method, many studies have addressed the electronic states associated to the N-impurities including the questions of localized or delocalized states. 

Other advances in cermet properties came in the 1970s, Japanese producers found that a cermet with a considerably finer microstructure could be created with the addition of titanium nitride (TiN). This modification significantly improved its oxidation resistance and high-temperature strength. 

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