Titanium films

To check the validity of the concept that polished copper interacts with titanium during polishing, titanium films (with no copper present on the wafers) were polished in a slurry containing Cu ions introduced as Cu(N03)2- Figure 4.43 shows the dependence of the polish rate of titanium on Cu(N03)2 concentration in the slurry. The polish rate of titanium increased with the addition of copper, supporting the hypothesis that Cu ions in the polishing... 

CDP10-Fb Titanium films are used in decorative coatings as well as wear-resistant tools because of their thermal stability and low electrical resistivity. TiN is produced by CVD from a mixture of TiCL and NH3TiN. 

In a biosensor application, Wolfson and his research group [10] employed microfabrication techniques to produce miniature electrodes for potential implantable, non-enzyme-based glucose sensors. Thin-film techniques, such as DC magnetron-sputtered processing, were used to deposit platinum film or platinum film enhanced with titanium film on quartz substrates. The geometric shapes of the quartz substrate include cylindrical rods and rectangular plates in a... 

Zwietering et al. [129), from their conductivity studies on titanium films, believed that adsorption took place up to a coverage close to one CO molecule per metal atom and that each molecule has an effective valency of two. The problems associated with this type of study, particularly in determining whether decomposition is occurring, make this analysis questionable. 

For example, Zhang and Cass have also immobilized alkaline phosphatase on a nanoporous nickel-titanium film for sensor applications. 

C. Huh, S.-J. Rark, Atomic force microscope tip-induced anodization of titanium film for nanofabrication of oxide patterns, J. Vac. Sci. Technol. B 18 (1) (January/February, 2000) 55-59. 

A dye-derivatized mesoporous titanium film is one of the key components in dye-sensitized solar cells. The electrochemical and photophysical properties of the ground and the excited state of the dye play an important role in the charge-transfer (CT) dynamics at the semiconductor interface (Chapter 5.3 in Volume 6). 

As described by the Wenzel wetting model, the increase of surface roughness should lead to a certain increase of contact angle (CA) values. To verify this statement, we investigated three different kinds of commonly used thin films known to be very different in grain size and, therefore, in surface roughness. Figure 3 shows the comparison of a 50 nm Au film, an 800 nm native oxidized titanium film (TiO") and an 800 nm wet chemically oxidized titanium film (TiO ) on a polished silicon substrate. 

Pretreatment of the titanium surface is an essential prerequisite for reproducible silanization. Untreated titanium films (as sputtered) gave imsatisfactory results. Optimum surface cleanliness and reactivity were achieved through water—vapor—plasma treatment, although other pretreatments such as H2O2 or HCl also gave satisfactory results. 

Figure 44. Changes in the Ti LMM Auger spectra, in the N[E) mode, from a lO-nm titanium film on SiO. after annealing to increasingly higher temperatures (1521...

Figure 1. Titanium 2p and carbon 1 s spectra of the 3, 12, and 150 nm titanium films and the bulk titanium.

On the other hand, investigation of the influence of plasma treatment on titanium film adhesion on the PA/PA substrate reveals a considerable inCTease in adhesion after plasma action. Table 18.1 shows that adhesion of the titanium film on the untreated PA/PP substrate is only 12%, which presents the utilization of the metal-PA/PP composite in any type of application. 

FIGURE 18.1 Effect of plasma treatment on the surface properties of a PA/PP substrate (a) on roughness and (b) on variation of the contact angle (0). (Adapted from Hoa Ta Thi Phuong et al. Improvement of the adhesion of titanium film on polymer substrate by argon plasma treatment. Proceedings of the International Conference on Engineering Physics, pp. 397-400, 2006.)... 

Influence of Plasma Treatment Conditions on the Adhesion of Titanium Films Deposited on PA/PP Substrate... 

Source Adapted from Hoa Ta Thi Phuong et al. Improvement of the adhesion of titanium film on polymer substrate by argon plasma treatment. Proceedings of the International Conference on Engineering Physics, pp. 397-400, 2006. 

Schneeweiss, H. J. and Abermann, R. (1992), Ultra-high vacuum measurements of the internal stress of PVD titanium films as a function of thickness and its dependence on substrate temperature. Vacuum 43, 463-465. 

Reactive sputtering deposition of perovskite oxide and oxynitride lanthanum titanium films structural and dielectric characterization. Cryst Growth Des., 13 (11), 4852-4858. 

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