Titanium-based thick film substrates

The tltanla-based thin film catalyst models were constructed by first oxidizing the titanium surface In 5 x 10 torr of O2 for approximately 30 minutes at 775 K. This produced an AES llneshape consistent with fully oxidized TIO2. The metal was then vapor deposited onto the oxide support with the latter held at 130 K. The thickness of the metal overlayer and Its cleanliness were verified by AES. After various annealing and adsorption procedures, these thin films were further characterized using SSIMS, AES and TDS. For comparison, some work was done with Pt on Al20s. In this case a Mo foil covered with AI2O3 replaced the Tl(OOOl) substrate. 

The key effect of oxide supports on the catalytic activities of metal particles is exerted through the interface between oxides and metal particles. The key objective of this study is to develop synthesis methodologies for tailoring this interface. Here, an SSG approach was introduced to modify the surface of mesoporous silica materials with ultrathin films of titanium oxide so that the uniform deposition of gold precursors on ordered mesoporous silica materials by DP could be achieved without the constraint of the low lEP of silica. The surface sol-gel process was originally developed by Kunitake and coworkers.This novel technology enables molecular-scale control of film thickness over a large 2-D substrate area and can be viewed as a solution-based... 

The above research groups produce diamond electrodes mainly on Si or Nd substrates. CSEM produces diamond films on Si discs of lOO mm diameter and 1-mm thickness. These electrodes are preferred in electrochemical cells with electrode stacks that are sensitive to the distance between electrodes. For efficiency and lifetime testing in comparison with standard dimensionally stable anodes (DSA), metakbased diamond electrodes, such as those based on Nb and recently also titanium, are used. These are referred to as DiaChem electrodes. 

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