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Thickness poly

Table 4. Electrical Properties of 6.35-mm Thick Poly(methyl methacrylate) Sheet ... Table 4. Electrical Properties of 6.35-mm Thick Poly(methyl methacrylate) Sheet ...
Sensitivity data for 193 nm exposures were obtained by imaging 1 mm to 1 cm diameter spots in a 1.2 pm thick poly(styrene) film using a Questek ArF excimer laser. Sensitivity was found to be a function of the fluence. For example, one pulse was sufficient to result in a full thickness image after treatment with TiCU and O2 RIE when the fluence was 6 mJ/cm2/pulse (Figure 10). Considerably more dose (32 mJ/cm2) was required to obtain the same result when the fluence was 1... [Pg.202]

Figure 13. Absorption spectrum of a 1 im thick poly(styrene) film on a quartz disc. Figure 13. Absorption spectrum of a 1 im thick poly(styrene) film on a quartz disc.
The first demonstration of a PEM with electrochromic properties was disclosed by SchlenofFand coworkers [66], using poly(butanylviologen)/ PSS films. While this film exhibited strong electrochromic response, it still required the use of an outer electrolyte solution. DeLongchamp and Hammond disclosed for the first time a solid-state device comprised of two electrochromic PEM-modified ITO electrodes separated by a 200-p,m thick poly(2-acrylamido-methane-2-propanesulfonic acid), proton-conducting PAMPS membrane (see Eigure 2.30) [196]. Both PEMs used in... [Pg.105]

Fig. 6-14. Potentiostatic EHD impedance plots, in Bode representation (reduced amplitude A(pSc /3)/A(0) and phase shift, versus dimensionless frequency pSc / ) for the oxidation of hydroquinone on a 360 nm thick poly(TV-ethylcarbazole) film at E - 0.7 V (diffusion plateau). Fig. 6-14. Potentiostatic EHD impedance plots, in Bode representation (reduced amplitude A(pSc /3)/A(0) and phase shift, versus dimensionless frequency pSc / ) for the oxidation of hydroquinone on a 360 nm thick poly(TV-ethylcarbazole) film at E - 0.7 V (diffusion plateau).
The rapid mixer is composed of layers that are fabricated separately and then assembled together. The main four channel device, represented by the cartoon of Fig. 12.2, is etched through a 1-mm-thick silicon wafer using an anisotropic Bosch process RIE (Unaxis 770, Unaxis). The depth of this etch requires a thick mask. We use a 7 pm layer of PECVD silicon dioxide (GCI PECVD Group Sciences Incorporated, San Jose, CA). This mixer is sandwiched between two 100 pm thick poly(dimethylsiloxane) (PDMS) layers (Duffy et al, 1998), which contain channels in a T configuration. [Pg.259]

In another report, a 50 nm thick poly(styrene-h-methylmethacrylate) block copolymer film with spherical domains was prepared on a sodium chloride monocrystal and coated by a thin layer of gold, replicating the domain pattern. Similar results were also obtained with poly(styrene-h-2-vinylpyridines) [113]. [Pg.130]

The vibrating ring/disk structure as well as the drive mechanism consists of 1 l- rm-thick poly-Si, which has been structured by deep RIE and released from the sacrificial oxide layer underneath by HE vapor phase etching. For the deposition of the thick poly-Si, a modified epitaxy deposition process (EPI poly) has been used [24]. However, as can be seen in Fig. 14.6, the deposition process leads to a rough poly-Si surface with Ra 100nm. For the removal of underlying topography, the surface has to be planarized by CMP in order to... [Pg.420]

Gold arrays are prepared by electron beam lithography (EBL) according to the following method. The bare substrate is a glass plate (10 mm X 10 mm) on which a thin indium tin oxide (ITO) substrate is evaporated. The ITO substrate is then spin coated (60 s, at 5000 rpm) with a 100 nm thick Poly methyl-methacrylate (PMMA) polymer,... [Pg.64]

Figure 3,57. SEMs of high aspect ratio images transferred into a hard-baked photoresist by oxygen RIE after mid-UV projection printing of a 0.25-ixm-thick poly silane resist. (Reproduced from r erence 193. Copyright 1984 American Chemical Society.)... Figure 3,57. SEMs of high aspect ratio images transferred into a hard-baked photoresist by oxygen RIE after mid-UV projection printing of a 0.25-ixm-thick poly silane resist. (Reproduced from r erence 193. Copyright 1984 American Chemical Society.)...
Figure 16.4 Dynamic capacitance-voltage curves of an organic MIS capacitor measured at 1 Hz for different gate-bulk voltage (V(3b) sweep directions at different temperatures. The organic semiconductor is a 48 nm thick poly(3-octylthiophene)... Figure 16.4 Dynamic capacitance-voltage curves of an organic MIS capacitor measured at 1 Hz for different gate-bulk voltage (V(3b) sweep directions at different temperatures. The organic semiconductor is a 48 nm thick poly(3-octylthiophene)...
Figure 25.4 MIR absorption spectrum measured on a free standing 7 pm thick poly-paraxylylene (PPX) film. The sharp peaks originate from vibronic excitations of the polymer and the periodic modulation attributed to Fabry-Perot oscillations. Figure 25.4 MIR absorption spectrum measured on a free standing 7 pm thick poly-paraxylylene (PPX) film. The sharp peaks originate from vibronic excitations of the polymer and the periodic modulation attributed to Fabry-Perot oscillations.
Sandwich-type diodes were fabricated using 70 nm thick poly(3,4-ethylenedioxythiophene/poly(styrene-sulfonate) (PEDOT PSS) spin coated film on ITO glass as hole injection electrode. 300 nm C6o films were grown on top by... [Pg.165]

Fig. 5.1 A survey spectrum of 1000 A thick poly(9,9-dictyl-fluorene) film as measured from XPS. Fig. 5.1 A survey spectrum of 1000 A thick poly(9,9-dictyl-fluorene) film as measured from XPS.
Silica fibers coated with an 85-/um thick poly-acrylate (PA) or a 100-/um thick polydimethylsiloxane (PDMS) film and a manual SPME device (Supelco) Quantitative extraction in 90 min at temperatures near to 300°C... [Pg.105]

Fig. 6.15 Schematic illustration of a one-dimensionally patterned flexible distributed Bragg reflector laser device. Active layer 400 nm m-LPPP. Substrate 125 pm thick poly(ethylene terephthalate) film covered with acrylic coating. Adapted from Kallinger et al. [46] with permission from Wiley-VCH. Fig. 6.15 Schematic illustration of a one-dimensionally patterned flexible distributed Bragg reflector laser device. Active layer 400 nm m-LPPP. Substrate 125 pm thick poly(ethylene terephthalate) film covered with acrylic coating. Adapted from Kallinger et al. [46] with permission from Wiley-VCH.
Dielectric thermal analysis was done with a Polymer Laboratory DETA from -140 to 230 C at a heating rate of PC7min using frequencies of 1, 3, 10, 50, and 100 kHz. The 20 mm diameter electrodes were used. The 0.57 mm thick poly(amide-imide) samples were tested either as-received or after drying at 190 C for 7 hours. The samples were tested under a nitrogen atmosphere to reduce the chance of ambient water condensing on the surface of the samples. [Pg.160]

Fig.4, SEM photograph of 8 fim carbon fiber encapsulated with 1.5 fim thick poly(oxyphenylene). Fig.4, SEM photograph of 8 fim carbon fiber encapsulated with 1.5 fim thick poly(oxyphenylene).

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