Thick regime

Figure 4.2 Approximate thickness regimes for the behavior of glassy polymer films [52], Reproduced with permission of the American Chemical Society.

The most accurate solution, which does not use any of the aforementioned approximations, can be obtained only numerically it utilizes the first-order expressions for the spatial variations of the stationary parts of local electrode potential, 37(x)> as well as local oxygen partial pressure, p(x)- These solutions will not be reproduced here. Instead this section will be concluded with a discussion of limiting frequency and thickness regimes, exemplifying the possible use of impedance spectroscopy for catalyst layer diagnosis. 

In addition, aspect ratio considerations, dependent on mechanical stability and pattern collapse propensity of resist lines, limit the thickness of resists designed for these technology nodes to ultrathin resist thickness regimes ( 100 nm and lower). However, the aspect ratio considerations must be balanced against the etch stability requirements that ensure successful pattern transfer to underlying substrates in a device. Both the aspect ratio and etch stability requirements must be balanced against the intrinsic resolution, particularly pitch resolution, of the resist in question. Hence, there is a trade-off between aspect ratio requirements and etch stability requirements on the one hand, and pitch resolution on the other. Therein lies the motivation for these advanced resist-processing schemes. 

Wang, H., Composto, R.J. Wetting and phase separation in polymer blend films Identification of four thickness regimes with distinct morphological pathways. Interface Sci. 11(2), 237-248 (2003)... 

The design space for CLs is divided by the thickness regime considered. Layers with IcL in the range of 1-10 pm must be fabricated as type I electrodes. Ultrathin layers... 

For measurements in liquid crystals, one usually works in the optically and thermally thick regime resulting in... 

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