Styrene, structural formula

Haward et al.t have reported some research in which a copolymer of styrene and hydroxyethylmethacrylate was cross-linked by hexamethylene diisocyanate. Draw the structural formula for a portion of this cross-linked polymer and indicate what part of the molecule is the result of a condensation reaction and what part results from addition polymerization. These authors indicate that the crosslinking reaction is carried out in sufficiently dilute solutions of copolymer that the crosslinking is primarily intramolecular rather than intermolecular. Explain the distinction between these two terms and why concentration affects the relative amounts of each. 

Stronlianile, 385 Strontium atomic size, 379 chemistry, 382 electron configuration. 378 heal of vaporization, 305 hydroxide, K,p, 383 ionization energies, 379 occurrence, 385 properties, 381 Structural formula, 31 Structural isomers, 327 Styrene, 345 Sublimation, 176 Substance, 28 pure, 29, 65, 70... 

The reason for such a behaviour of arsenic acid is that arsenic is a member of the group 5A elements in the periodic table. Phosphorus and antimony are also group 5 elements and are known to be chemically similar to arsenic. On this basis [8,9], the antimonic acids were found to be poor cassiterite collectors. The alkyl phosphonic acids were not selective collectors. The ethylphenylene phosphonic acid was found to produce similar or better results compared to /7-tolyl arsonic acid. The structural formula for phosphonic acid (Figure 21.5) is similar to that of /7-tolyl arsonic acid but arsenic was replaced with phosphoms. The styrene phosphonic acid radicals are C6H5-CH-CH and p-ethylphenylene CH3-CH2-C6H4. 

The polymer resist exhibiting the lowest PE rate or highest etch resistance versus PMMA or oxide is poly(styrene) (see Table IV). This system, like the others of Table IV, is representative of a vinyl pol3mier with general structural formula of -(CH2-CXY)-. Poly(chlorostyrene), a chlorinated derivative of the aromatic poly(styrene), exhibits equal resistance towards all three dry etch processes. Here halogenatlon has not enhanced the etch rate or reduced the resistance as seen before for PTECM, PTFEM, and PMCA nonaromatic systems. Therefore, the aromatic side group must... 

Fig. 1 Structural formula of copolymer of styrene and dimethylaminopropylmaleimide (CSDAPM) and poly(diallyldimethylam-monium chloride) (PDADMAC)...

Copolymers of acrylonitrile and methyl methacrylate (115) and terpolymers of acrylonitrile, styrene, and methyl methacrylate (116,117) are used as barrier polymers. Acrylonitrile copolymers and multipolymers containing butyl acrylate (118—121), ethyl acrylate (122), 2-etliylliexyl acrylate (118,121,123,124), liydroxyethyl acrylate (120), vinyl acetate (119,125), vinyl ethers (125,126), and vinylidene chloride (121,122,127—129) are also used in barrier films, laminates, and coatings. Environmentally degradable polymers useful in packaging are prepared from polymerization of acrylonitrile with styrene and methyl vinyl ketone (130). Table 5 gives the structures, formulas, and CAS Registry Numbers for several comonomers of acrylonitrile. 

The structural formula for styrene, which is the monomer for the common plastic polystyrene, is shown below. Convert this to a line drawing. 

Prebyl et al. [24] selected the latter method and they set the cone voltage at -100 V. They analyzed a commercial copolymer (the suppher was a well-known company) with units of styrene sulfonate (SS) and maleic acid (MA). Scheme 45.1 illustrates the structural formula of the SS-MA copolymer. The ESI spectrum contains peaks up to 0.5 kDa. Intense peaks at m/z 115 and 183 are observed and correspond to MA and SS, respectively (in aqueous environment, SS units are transformed in styrene sulfonic acid units). The mass range is astonishingly short, especially when compared with supplier s specifications (Mn = 20 kDa). It is quite apparent that partial degradation occurred due to the unusual cone voltage. The authors were able to assess the relation between the observed ion intensities and the sample composition. 

Draw the structural formula for a segment of alternating copolymer made from styrene and methyl methacrylate. 

Radical polymerization of styrene gives a linear polymer. Radical polymerization of a mixture of styrene and 1,4-divinylbenzene gives a cross-linked network polymer of the type shown in Figure 29.1. Show by drawing structural formulas how incorporation of a few percent of 1,4-divinylbenzene in the polymerization mixture gives a cross-linked polymer. 

The most widely used synthetic rubber is a copolymer of st)nrene and butadiene called SB rubber. Ratios of butadiene to styrene used in pol3merization vary depending on the end use of the polymer. The ratio used most commonly in the preparation of SB rubber for use in automobile tires is 1 mole styrene to 3 moles butadiene. Draw a structural formula of a section of the polymer formed from this ratio of reactants. Assume that all carbon-carbon double bonds in the polymer chain are in the cis configuration. 

Diluted with a monomer like styrene, Hycar vinyl-terminated butadiene cry-lonitrile copolymer, with the structural formula... 

Kaindl, G. Woell, Ch. The electronic structure and orientation of styrene adsorbed on FeO and Fe304. A spectrographic investigation J. Phys. Chem. B 104 7694-7701 Wyszecki, G. Stiles, WS. (1982) Color science Concepts and methods, quantiative data and formulae. 2" ed., J. Wiley Sons, New York, 950 pp. 

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