Spin coating speed

DeLongchamp, D.M. et al.. Variations in semiconducting polymer microstrnctnre and hole mobility with spin-coating speed, Chem. Mater. 17, 5610-5612, 2005. 

Figure 3.15. (a) Cross-sectional SEM of a spin-coated KSb5Se8 film, prepared using a 0.12M precursor solution (in hydrazine) with 5000rpm spin speed and deposited on silicon coated with -lOOnm of thermal SiOx. (b) Similarly prepared KSb5S8 film, subsequently heated to 475 °C for 2 min on a hot plate and cooled to room temperature. 

In the example of Fig. 7.15 [43j rhodium particles have been deposited by spin coat impregnation of a Si02/Si substrate with an aqueous solution of rhodium trichloride. After drying, the particles were reduced in hydrogen. The images show samples prepared at three different rotation speeds in the spin coating process, but with concentrations adjusted such that each sample contains about the same amount of rhodium atoms. The particles prepared at high rotation speeds are smaller, which... 

SPIN-COATING Polymer composition Molecular weight Solvent boiling point Solvent vapor pressure Solution viscosity Solution concentration Spinning speed Acceleration Temperature Humidity Filtration... 

AF polymers can be extruded, compression and injection-molded, solution or spray-coated as well as spin-coated from solution. A representative plot showing the dry-film thickness obtained by spin-casting from two different concentration AF solutions at different spin speeds is shown in Figure 2.8. It is possible to prepare multiple coats of AF using this technique. Although most of the solvent is removed in the spin-coating step the polymer must be heated above its glass transition temperature to ensure removal of the last traces of solvent. 

All sensitive layers were prepared from solutions of Makrolon in mixtures of chloroform and dichlorobenzene by a spin-coating process. By adjustment of the rotation speed and time the thickness of the layers were varied between 35 nm and 455 nm. Layer thicknesses and refractive indices were determined by spectral ellipsometry. Furthermore the polymer thicknesses were verified by a surface profilometer (Alpha Step 500, Tencor Instruments, Mountain View, USA). 

Thin solid films of polymeric materials used in various microelectronic applications are usually commercially produced the spin coating deposition (SCD) process. This paper reports on a comprehensive theoretical study of the fundamental physical mechanisms of polymer thin film formation onto substrates by the SCD process. A mathematical model was used to predict the film thickness and film thickness uniformity as well as the effects of rheological properties, solvent evaporation, substrate surface topography and planarization phenomena. A theoretical expression is shown to provide a universal dimensionless correlation of dry film thickness data in terms of initial viscosity, angular speed, initial volume dispensed, time and two solvent evaporation parameters. 

The spin-coating process allows the preparation of uniform thin films on plane snbstrates . In a typical spin-coating experiment the precursor solution is placed onto the center of the substrate, which is then rotated at high speed (typically between 800... 

Prior to spin coating, both ends of a pre-fabricated porous support, either in the form of a tube or a monolithic honeycomb element, are filled with the slip and temporarily sealed with gaskets. Slips of Ni, A1 and AI2O3 have been spin coated at a rotational speed of up to about 1300 rpm to form membrane layers [Sumitomo Electric Ind., 1981 NGK Insulators, 1986]. The development of a coating layer is expected to be faster with the in coating process than the dip coating process due to the centrifugal force. 

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