Silicon microstructures

This simple reactor concept is based on a microstructured silicon chip (Figure 3.18) covered by a Pyrex-glass plate by anodic bonding [73, 74]. The silicon microstructure comprises, in addition to inlet and outlet structures, a multi-channel array. Only the Pyrex-glass plate acts as cover and inlet and outlet streams interface the silicon chip from the rear. 

Hurst, K.M., Roberts, C. and Ashurst, W. (2009) A gas-expanded liquid nanoparticle deposition technique for reducing the adhesion of silicon microstructures. Nanotechnology, 20 (18), 185303. 

Luminescent silicon microstructures formed by other methods than anodization and stain etching. 

Silicon microstructures can be categorized according to the dimensionality of the confinement. Most PL studies deal with silicon structures confined in three dimensions such dot-like structures are designated zero-dimensional (OD). An overview of size-dependent properties of silicon spheres is given in Table 6.1. Standard methods of generating such microstructures are gas-phase synthesis [Di3, Li7, Scl2], plasma CVD [Ru2, Col, Ta8] or conventional chemical synthesis [Mal5]. 

Christel LA, Petersen K, McWilliam W, Northrup MA. Rapid, automated nucleic acid probe assays using silicon microstructures for nucleic acid concentration. J Biomech Eng 1999 121 272-279. 

S.-F. Chuang, S. D. Collins, and R. L. Smith, Porous silicon microstructure as studied by transmission electron microscopy, Appl. Phys. Lett. 55(15), 1540, 1989. 

M. Christophersen, P. Merz, J. Quenzer, J. Carstensen, and H. Foil, A new method of silicon microstructuring with electrochemical etching, Phys. Status Solidi, (a)l 2, 1, p. 561, 2000. 

For a given type and orientation, the etch rate of silicon in alkaline solutions is largely independent of doping concentration up to a concentration of about 1019 cm-3 [33, 80]. At a doping level of about 2 x 1019 cm 3, the etch rate of boron doped silicon drastically decreases with increasing dopant concentration [33, 86,144]. Reduction by as much as 3 orders of magnitude can be obtained by varying the boron concentration from about 1019 to above 102° cm-3. This feature has been widely used as an etch-stop technique for the fabrication of silicon microstructures. 

Wilding P, Shoffner MA, Kricka LJ. PCR in a silicon microstructure. Clin Chem 1994 40 1815-8. 

Wilding P, Shoffner M A and Kricka L J 1994 PCR in a silicon microstructure Clin. Chem. 40 1815-18... 

Miliotis, T., Marko-Varga, G, Nilsson, J., and Laurell, T., Development of silicon microstructures and thin-fikn MALDI target plates for automated proteomics sample identifications. Journal of Neuroscience Methods, 109, 41 6, 2001. 

W. Lang, Silicon microstructuring technology. Materials Science and Engineering Reports, 17(1), 1-55,1996. 

Wilding P, Shofiner MA, Kricka LJ (1994) PCR in a Silicon Microstructure. Clin Chtan 40 1815... 

Silicon micromachining concerns a process that involves the removal of silicon materials using wet chemical or dry plasma process in order to create 3-D silicon or non-silicon microstructures for making functional devices such as microsensors, microactuators, biochips, etc. 

H. Westberg, M. Boman, S. Johansson and J. A, Schweitz, Freestanding silicon microstructures fabricated by laser chemical processing. Physics, 73 [11], 7864-7871 (1993). 

Canham LT, Cullis AG, Pickering C, Dosser OD, Cox TI, Lyneh TP (1994) Lumineseent anodized silicon aerocrystal networks prepared by supercritical drying. Nature 368 133-135 Cao L, Price TP, Weiss M, Gao D (2008) Super water- and oil-repellent surfaces on intrinsically hydrophilic and oleophillic porous silicon films. Langmuir 24(5) 1640-1643 Chao Y (2011) Optical properties of nanostructured silicon. Compr NanoSci Technol 1 543-570 Chuang SF, Collins SD, Smith RL (1989) Porous silicon microstructure as studied by transmission electron microscopy. Appl Phys Lett 55 1540-1543 Costa J, Roura P, Morante JR, Bertran E (1998) Blackbody emission under laser excitation of silicon nanopowder produced by plasma-enhanced chemieal-vapour deposition. J Appl Phys 83(12) 7879-7885... 

Kalinowski T, Rittersma ZM, Benecke W, Binder J (2000) An advanced micromachined fermentation monitoring device. Sens Actuators B 68 281-285 Kronast W, Muller B, Siedel W et al (2001) Single-chip condenser microphone using porous silicon as sacrificial layer for the air gap. Sens Actuators A 87(3) 188-193 Lammel G, Renaud P (2000) Free-standing, mobile 3D porous silicon microstructures. Sens Actuators A 85(l-3) 356-360... 

Garel O et al (2007) Fabrication of free-standing porous silicon microstructures. J Micromech Microeng 17 S164-S167... 

Lammel G, Renaud P (2000) Free standing mobile 3D porous silicon microstructures. Sens Actual A 85(l-3) 356-360... 

Barillaro G, Nannini A, Pieri F (2002a) Dimensional constraints on high aspect ratio silicon microstructures fabricated by HF photoelectrochemical etching. J Electrochem Soc 149 C180-C185... 

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