Resistivity composites

Germany, the United Kingdom, and the United States shared ahke in the early development of stainless steels. In the United Kingdom in 1912, during the search for steel that would resist fouling in gun barrels, a corrosion-resistant composition containing 12.8% chromium and 0.24% carbon was reported. It was suggested that this composition be used for cutiery. In fact, the composition of AISI Type 420 steel (12—14% chromium, 0.15% carbon) is similar to that of the first corrosion-resistant steel. 

The sensitivity of both TBSS and TBMS can be further improved by the addition of higher weight fractions of Ts (Table VI). The absorbance of the TBMS/Ts resist compositions is also given in Table VI. 

Materials Resist composition Resist thickness Resist Tg /im C... 

As for enviromnental resistance, there exists a design chart that is somewhat useful for this case study, but, more importantly, may be of use in other designs. The compatibility of various materials in six common environments is shown in Figure 8.16. The suitability of a material for each of the six environments improves as you move from the center of the chart outward. In this case, resistance to organic solvents is of primary importance. We see that all ceramics and glasses, all alloys, and some polymers such as poly(tetrafluoroethylene), PTFE, will provide excellent resistance. Composites will provide good resistance, which may be satisfactory for our application. 

Title Polymer Compound, Positive Resist Composition and Process for Forming Resist Pattern... 

Observations The current application pertains to positive resist compositions that... 

TABLE 1. Physical Properties of Positive Resist Compositions... 

Positive-type resist compositions, (I), were prepared by Ishiduka et al. (1) containing adamanthyl, 7-butyolactonc, and a perfluoroalcohol component for use in liquid immersion lithography. Perfluoro acetal and ketal, (II), monomers... 

Chemically amplified resist compositions having a high transparency to light with a wavelength of 220 nm or less were prepared by Maeda et al. (4) containing alicyclic -y-lactonc, (IV). 

Florinated norbomane ester monomers, (V), prepared by Harada et aL (2) were effective in resist compositions when processed by ArF lithography with advantages that included improved resolution, transparency, minimal line edge roughness, and etch resistance. 

Title Lactone-Containing Compound, Polymer, Resist Composition, and Patterning Process... 

TABLE 1. Resist Composition of Selected Copolymers and Corresponding Molecular Weights"... 

TABLE 2. Resolution Properties of Lactone-Containing Polymers in Resist Compositions When Exposed to an ArF Excimer Laser"... 

Additional lactone containing positive-resist compositions, (I), are described by Watanabe et al. (1), the authors (2), and Funatsu et al. (3), respectively. 

Perfluoroalcohol containing monomers were previously prepared by the authors (4) and Komoriya et al. (5) and used in preparing radiation-sensitive resist compositions, (II) and (III), respectively. 

Hatakeyama et al. (6) prepared hydroxy vinylnaphthalene positive-resist compositions, (IV), that exhibited unusually high-resolution properties. 

Resist compositions were prepared consisting of the step 2 product (80 g), the photoacid generator, triphenylsulfonium nonafluorobutanesulfonate, (4.4 g), the base, tri-(2-methoxymethoxyethyl)amine (0.94 g), and solvents 1-methoxyisopropyl acetate 560 g) and cyclohexanone (240). Compositions were filtered through a Teflon filter with a pore diameter of 0.2 pm and then heated to 50°C for 20 hours and cooled. A polymer having an Mn of 7200 Da was then isolated. 

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