Polymers, Resist Compositions, and Patterning Process

Title Polymers, Resist Compositions, and Patterning Process 

Matsushita Electric Industrial Co., Ltd. (Kadoma, JP) Central Glass Co., Ltd. (Ube, JP) 

Novel terpolymer compositions containing 4-(di-trifluoromethyl-hydroxymethyl)-1-(di-trifluoromethy)methyl)cyclohexyl] vinylsulfonate have been prepared having excellent transparency, substrate adhesion, and plasma etching resistance. The introduction of perfluoronorbornene resulted polymers that were especially suitable for deep UV lithography. 

Preparation of [4-(di-Trifluoromethyl-Hydroxymethyl)-l-((di-Trifluoromethy) Methyl)-Cyclohexyl] Vinylsulfonate Terpolymer 

A 300-ml flask was charged with 4-(di-trifluoromethyl-hydroxymethyl)-l-((di-tri-fluoromethyl) methyl)cyclohexyl] vinylsulfonate (7.00 g), 5-(2,2-trifluoromethyl-2-hydroxy)ethyl-norbomene (7.58 g), and t-butyl trifluoromethylacrylate (5.42 g) dissolved in 1,4-dioxane (5.0 g). This mixture was then treated with 2,2 -azobisiso-butyronitrile (0.34 g) and polymerized at 60°C for 24 hours. The reaction mixture was poured into 1 liter of hexane, and the precipitated was isolated. The polymer was purified by dissolving in THF and re-precipitating in hexane, this process being repeated twice, and 12.5 g of a white polymer product were isolated. 

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Title Lactone-Containing Compound, Polymer, Resist Composition, and Patterning Process... 

Title Polymer Compound, Positive Resist Composition and Process for Forming Resist Pattern... 

To achieve a manufacturable system for sub-0.5-pm patterning, extremely precise control of the molecular properties, structure, composition, and purity of the polymer is required (Table 4). Meeting these requirements provides intellectual challenges in ultrapurification reaction engineering and chemical synthesis. An illustration of the control required in this synthesis process can be found in a negative electron beam resist, GMC. 

Title Monomer Having Fluorine-Containing Acetal or Ketal Structure, Polymer Thereof, and Chemical-Amplification-Type Resist Composition as Well as Process for Formation of Pattern with Use of the Same... 

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