Resist materials thin film structures

To further explore the behavior of the (BEDT-TTF)2l3 interfacial resistance phenomena, samples of the organic conductor were deposited onto Pt thin-film structures. The interfacial resistance properties as a function of temperature were also explored for (BEDT-TTF)2l3 samples with Pt contacts. In these structures, an activated temperature dependence was observed for both the four-point resistivity and contact resistance. Here the magnitude of the contact resistance between the two materials is comparable to that between (BEDT-TTF)2l3 and YBa2Cu307- - No decreases in interface resistance were noted at low temperatures as in the (BEDT-TTF)2l3/YBa2Cu307 8 bilayer structures. Also, the similarity in the magnitudes of the contact resistance in the (BEDT-TTF)2l3/YBa2Cu307-8 and the (BEDT-... 

The work on carbon nitride solids is strongly related to research on diamondlike carbon (DLC) materials [5, 6]. DLC materials are thin film amorphous metastable carbon-based solids, pure or alloyed with hydrogen, which have properties similar to that of crystalline diamond (high hardness, low friction coefficient, high resistance to wear and chemical attack). This resemblance to diamond is due to the DLC structure, which is characterized by a high fraction of highly cross-linked sp -hybridized carbon atoms. To obtain this diamond-like structure... 

The microstructure was realized by a dry-film photoresist technique and based on established techniques from printed circuit board technology [142], Dry resists are available as thin films, e.g. of thickness 50 or 100 pm. The resist films are encased in other polymer materials which are later removed. The resist films can be deposited on various base materials such as silicon or polymers giving mechanical stability. Lamination is carried out with a roller laminator. Then, exposure is made and spray development without any solvents follows. The process steps can be repeated at multi-laminated structures. Closed structures can be made in this way. 

Figure 2.9. The N-alkyldiazopiperidinedione structure is typical of the 1,3-diacyl-2-diazo compounds studied at IBM. Photolysis produces a carboxylic acid analogous to the chemistry of diazonaphthoquinones. These materials absorb strongly in the DUV region, but bleach completely as indicated in the spectra of a methanolic solution bottom). Resists formulated from these materials in novolac show residual unbleachable absorbance due to the resin as shown in the spectra of thin films (top).

---