Polymers photoresist applications

Table 8. Photocurable Polymer Systems For Photoresist Applications...

Diivcor Photoresist Polymers (photolithographic applications, primarily deep UV (193 nm and 157 nm) positive photo-resists). 

In this chapter, attention is focused on a number of polymers that are either themselves characterized by special properties or are modified for special uses. These include high-temperature and fire-resistant polymers, electroactive polymers, polymer electrolytes, liquid crystal polymers (LCPs), polymers in photoresist applications, ionic polymers, and polymers as reagent carriers and catalyst supports. 

Moreover, Shi and his group reported electrochemical deposition of PPy microcontainers onto soap bubbles associated with O2 gas released from the electrolysis of H2O in an aqueous solution of /3-naphthalenesulfonic acid (/3-NSA), camphorsulfonic acid (CSA), or poly(styrene sulfonic acid) (PSSA), which act both the surfactant and dopant [79-81]. Morphologies such as bowls, cups, and bottles could be controlled by electrochemical conditions (Figure 11.6). However, the microcontainers were randomly located on the electrode surface, which limited further applications, Shi and coworkers reported a linear arrangement of PPy microcontainers by self-assembly with gas bubbles acting as templates on a silicon electrode surface patterned by photolithography [82]. They found that capillary interactions between the gas bubbles and the polymer photoresist walls led the microcontainers to be arranged linearly. 

Photo-rearrangements in polymers are important because they can lead to pronounced property changes. For example, polymers containing o-nitrobenzyl pendant groups become soluble in aqueous solution since benzyl ester groups are converted into carboxyl groups. Therefore, such polymers are applicable as positive-tone photoresists in lithographic processes [50, 51] (see Section 9.1). 

Multi-hydroxyphenols, such as 1,3-benzenediol, are copolymerized with phenol or (2-,3-,or 4-methyl)phenol to tailor-make polymers for photoresist applications. 

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