Poly photosensitivity

Dichromated Resists. The first compositions widely used as photoresists combine a photosensitive dichromate salt (usually ammonium dichromate) with a water-soluble polymer of biologic origin such as gelatin, egg albumin (proteins), or gum arabic (a starch). Later, synthetic polymers such as poly(vinyl alcohol) also were used (11,12). Irradiation with uv light (X in the range of 360—380 nm using, for example, a carbon arc lamp) leads to photoinitiated oxidation of the polymer and reduction of dichromate to Ct(III). The photoinduced chemistry renders exposed areas insoluble in aqueous developing solutions. The photochemical mechanism of dichromate sensitization of PVA (summarized in Fig. 3) has been studied in detail (13). 

Poly(vinyl cinnamate) Resists. Dichromated resists exhibit numerous shortcomings which include lot-to-lot variabiUty of the components, aging of the formulated resists in solution and in coated form, poor process stabiUty (due to a sensitivity to variations in temperature and humidity), and intrinsically low photosensitivity requiring long exposure times for adequate insolubilization. 

Fig. 4. Chemistry of poly(vinyl cinnamate) negative-acting resist. Initial light absorption by the photosensitizer is followed by energy transfer to produce a pendant cinnamate group in a triplet electronic state. This combines with a second cinnamate on another polymer chain, forming a polymer—polymer...

Materials. For holographic information storage, materials are required which alter their index of refraction locally by spotwise illumination with light. Suitable are photorefractive inorganic crystals, eg, LiNbO, BaTiO, LiTaO, and Bq2 i02Q. Also suitable are photorefractive ferroelectric polymers like poly(vinyhdene fluoride-i o-trifluorethylene) (PVDF/TFE). Preferably transparent polymers are used which contain approximately 10% of monomeric material (so-called photopolymers, photothermoplasts). These polymers additionally contain different initiators, photoinitiators, and photosensitizers. 

Photosensitized Reactions for Polymers. The economic and technical features for photocross-linking, photosolubilizafion, and photopolymerization reactions have been reviewed (55). The widely used poly(vinyl ciunamates) (PVCN) photocross-link by a photodimerization reaction. 

Bearing in mind the semiconductive properties of PCSs one might expect that these substances, being p-type semiconductors in air, possess photosensitizing activity. We, indeed, have demonstrated40 that PCSs, such as poly(schiff base)s, salts of poly(propynoic acid), or polyquinoline, are active photosensitizers of... 

Thus, the photo-activity of poly[bis(4-benzoylphenoxy)phosphazene] under illumination could be finely tuned by irradiating the polymer in the presence of variable amount of naphthalene, a typical triplet state energy quencher [474]. The same polymer could be used as polymeric photosensitizer to induce the... 

In these processes poly[bis(4-benzoylphenoxy)phosphazene] has mostly been used as photosensitive substrate because of the triplet state reactivity... 

Deen, M. Kazemeini, M. 2005. Photosensitive polymer thin-film FETs based on poly(3-octylthiophene). Proc. IEEE 93 1312-1320. 

A photosensitive composition, consisting of an aromatic azide compound (4,4 -diazidodi-phenyl methane) and a resin matrix (poly (styrene-co-maleic acid half ester)), has been developed and evaluated as a negative deep UV resist for high resolution KrF excimer laser lithography. Solubility of this resist in aqueous alkaline developer decreases upon exposure to KrF excimer laser irradiation. The alkaline developer removes the unexposed areas of this resist. 

The photosensitive azide compound was 4,4 -diazidodiphenyl methane (m.p. 44.0 t). The poly(styrene-co-maleic acid half ester) was used as a resin matrix. 

A negative deep UV resist, consisting of a photosensitive 4,4 -diazidodiphenyl methane and a poly-(styrene-co-maleic acid half ester) resin, has been found to meet the requirements needed for KrF excimer laser lithography. 

Reactions with Isocyanates. The reaction of alcohols with isocyanates to form carbamates is well known and similar reactions with poly(vinyl alcohol) would be expected. Until recently, the only available reaction conditions were to use a heterogeneous reaction mixture or to run the reaction in a poor solvent for poly(vinyl alcohol). The best poly(vinyl alcohol) solvents, water and formaide derivatives, react rapidly with isocyanates. Nevertheless, several such reactions have been run in the past and we will cite only a few of them. A potentially photosensitive polymer was made by the reaction of allyl isocyanate with poly(vinyl alcohol) (57) and several workers have crosslinked poly(vinyl alcohol) with hexamethylene diisocyanate (58.59). 

Besides silicon, other materials have also been used in micro fuel cells. Cha et al. [79] made micro-FF channels on SU8 sheets—a photosensitive polymer that is flexible, easy to fabricate, thin, and cheaper than silicon wafers. On top of fhe flow channels, for both the anode and cathode, a paste of carbon black and PTFE is deposited in order to form the actual diffusion layers of the fuel cell. Mifrovski, Elliott, and Nuzzo [80] used a gas-permeable elastomer, such as poly(dimethylsiloxane) (PDMS), as a diffusion layer (with platinum electrodes embedded in it) for liquid-electrolyte-based micro-PEM fuel cells. 

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