Photosensitized degradation poly

Photosensitized degradation of poly(olefin sulfones) similar to the Hg(3P) photosensitized reactions of olefin sulfones make them subject to photodegradation in easily accessible wavelength regions. Almost all poly(olefin sulfones) have been reported only as positive tone electron beam resists (4). As the only exception, poly(5-hexene-2-one sulfone) has been reported as a positive tone photoresist with or without a photosensitizer, benzophenone (5). Because this polymer has a carbonyl chromophore, its photosensitivity is clearly derived from the polymer structure itself. 

This reaction was reported for the benzophenone photosensitized degradation of polypropylene (92),polystyrene (95), poly(vinyl alcohol) (94),polyisoprene (95,96),polyurethane (97) and polyadenylic acid (98) In solid state benzophenone also produce an extensive crosslinking of polyethylene (99-105) It has also been found that benzophenone and its derivatives caused an initial rapid oxidation,increasing with ketone concentration (70) Currently the relative importance of singlet oxygen formation in energy transfer reaction between excited benzophenone and molecular oxygen is discussed (92,104) ... 

Sakai, W., Kinoshita, M., Nagata, M. and Tsutsumi, N. (2001) ESR studies of photosensitized degradation of poly(L-lactic add) via photoionization of dopant. Journal of Polymer Science Part A Polymer Chemistry, 39,706-714. 

Support for the conjugated alkene photosensitized degradation of poly(vinyl chloride) comes from the observation that photolysis of thermally degraded polymer (which contains conjugated polyene sequences) gives a substantially increased rate of dehydrochlorination [11]. 

Poly(butene-l sulfone) (PBS), a sensitive, positive, electron beam resist, is highly sensitive to 185-nm radiation (Table 3.4) (9). However, PBS does not absorb above 200 nm, and the sensitization has not been successful. Incorporation of pendant aromatic rings into the polysulfone structure extends the photosensitivity to the DUV and mid-UV regions (72). Himics and Ross (73) reported that carbonyl-containing poly(olefin sulfones) such as poly(5-hexen-2-one sulfone) are sensitive to UV-induced degradation and... 

Poly(acrylates) and (alkyl acrylates). - Structured nanopore films of poly(styrene-block-methyl methacrylate) copolymers have been made with controlled spectral sensitivity, such that each block is sensitive to a specific degradation wavelength. In copolymers of 2,2,2-trifluoroethyl methacrylate with vinyl ethers, the photosensitivity is controlled by the vinyl ether units. Photodegradation occurs at the tertiary positions of the ether units followed by lactone formation and chain scission processes. Furthermore, the fluorinated side chains have been found to inhibit cyclization reactions. 

Benzophenone was used as photosensitizer in a study of the photo-decomposition of benzene solutions of polystyrene and poly(a-methyl styrene). Laser photolysis (A 265 nm) of poIy(a-methyl styrene) in chlorofonn and carbon tetrachloride proceeded by attack of solvent radicals in the polymer molecules resulting in main chain cleavage. " A series of papers have been devoted to the study of the photo-induced decomposition of poly(a-methyl styrene) in benzene solutions, using a,a -bisisobutyronitrile, benzophenone, and triphenyl-methyl cations as sensitizers. Spin-trapping techniques were used to detect transient radicals formed during benzophenone-sensitized degradation of poly-(a-methyl styrene). The rate constant for intramolecular reaction of the macroradical was estimated. 

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