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Polish residues

B. Disk Polishing Residue (Hard Disk Manufacturer) contains nickel. [Pg.292]

Ge is easily etched in solutions with H2O2 (Sioncke et al., 2008) and thus some of the initial Ge CMP work utilized just deionized water for the integrated post-CMP clean. But in Ong et al. (2010) it was shown that the use of deionized water was not sufficient and there were problems with polishing residuals, which were not removed by cleaning with deionized water. The implementation of diluted ammonia as cleaning chemistry improved the post-CMP defectivity and no measurable etching of the Ge was observed. [Pg.125]

Both foreign materials (FM) and polish residues (PR) are additive defects residing on the wafer surface as a result of a manufacturing process. As the names suggest, FM usually refers to unwanted material after CMP, while PR relates to the debris and residues resulting from polishing. The two terms are usually used interchangeably. [Pg.436]

Defects from CMP are the largest yield detractor for logic devices in advanced technology nodes. CMP defects such as polish residues, foreign materials, scratches, HM, and DE not only result in yield loss and reliability issues at the current interconnect level, but can also propagate upward and interfere with subsequent process steps to cause other types of defects at higher levels. [Pg.458]

Sections of ceramic samples are often subjected to microprobe analyses or SEM examinations with an accessory device for energy-dispersive X-ray analysis. It is essential to avoid the introduction of any elements which are intended to be measured in these examinations or which may have a disruptive influence on them. It is therefore essential to pay special attention to swarf from metal-bonded diamond wheels, composite disks, or disks made of cast iron, lead, copper, or tin, as this swarf may accumulate in pores or in the form of thin surface films. This also applies to swarf from the sample and polish residue, which may remain on the sample after final polishing with alumina, for example. [Pg.134]

The advantages claimed for organotin polymer-based antifouling paints include constant toxicant deHvery vs time, erosion rate and toxicant deHvery are controUable, no depleted paint residue to remove and dispose, 100% utilization of toxicant, polishing at high erosion rates, surface is self-cleaning, and function is continuously reactivated. [Pg.71]

Artifacts introduced through sample preparation are common materials these may be bits of facial tissue, wax, epithelial cells, hair, or dried stain, all inadvertently introduced by the microscopist. Detergent residues on so-called precleaned microscope slides and broken glass are common artifacts, as are knife marks and chatter marks from sectioning with a faulty blade, or scratch marks from grinding and polishing. [Pg.67]

The sliced sheet will still contain large quantities of alcohol and it is necessary to season the sheet at elevated temperatures. This may only take three days at 49°C for 0.010 in (0.025 cm) thick sheet but will take about 56 days for 1 in (2.5 cm) thick blocks. The removal of alcohol, as might be expected, is accompanied by considerable shrinkage. Fully seasoned sheet has a volatile content of 2%, the bulk of which is water but there is some residual alcohol. The sheet may be fully polished by heating in a press between glazed plates under pressure for a few minutes. Because the material is thermoplastic it is necessary to cool it before removal from the press. [Pg.619]

Metall-oxyd, n. metallic oxide, -oxydhydrat, n. metal (lie) hydroxide, -papier, n. metal (lie) paper, -poliermittel, n. metal polish, -probe, /, test for metal, assay, -putzmittel, n. metal polish, -rohr, n., -rbhre, /. metal tube oi-pipe, -rohrehett, n. (small) metal tube or pipe, -riickstand, m. metallic residue, -sa-fran, m. crocus of antimony, -salz, n. metallic salt. [Pg.297]

In contrast chemical and electrolytic polishing enables a smooth level surface to be produced without any residual stress being developed in the surface because the surface is removed by dissolution at relatively low chemical potential and at relatively low rates is such a way that metallic surface asperities are preferentially removed. For this to be most effective the solution properties must be optimised and the pretreatment must leave an essentially bare metal surface for attack by the electrolyte. [Pg.300]

Chemical polishing, yielding a surface of high specular reflectivity, exploits fully optimised bright dip solutions often achieved by the further addition of phosphoric acid at the expense of the residual water. Because phosphoric acid is relatively viscous at lower temperatures (e.g. less than 40°C) it can act as diffusion layer promoter (C), but its presence increases the chemical costs considerably. [Pg.302]

The corrosion process is modified by the physical state of the surface. Grinding and polishing processes, in particular, leave the structure in a more open state and with a degree of roughness and residual stress all can contribute to accelerated corrosion. [Pg.879]

Gravitational Methods GONELL AIR ELUTRIATOR. This is the prototype of all analytical separators with laminar air flow. It consists of a cylindrical brass tube (or a series of tubes) with a conical base. An air inlet is provided in this base on the axis of the tube. The sample of powder is placed in the inlet cone, and air is blown thru the largest tube until separation is deemed complete, or for specified periods of time. The residue is removed, weighed, and transferred to a smaller diameter tube, and the test is repeated. The tube should have polished internal surfaces and should be periodically tapped or vibrated to disturb settled powder... [Pg.511]

Cwiertniewska E, Potrzebnicka K. 1979. [Determination of endosulfan residues in strawberries and raspberries.] Rocz Panstw Zakl Hig 30 261-265. (Polish)... [Pg.281]

Decaffeination of green coffee beans is most usually carried out with a water/solvent partition system. The green coffee beans are first steamed until they are hot, wet, and swollen, to make the caffeine available. Solvent is then used to extract the caffeine out of the aqueous phase of the beans. Finally, the beans are steamed to drive off residual solvent. The coffee beans lose their wax surface covering in the process, as well as some flavor components. For this reason, the Robusta and Brazilian Arabica coffees that are dry-processed and have the most powerful flavors are usually the types that are decaffeinated. They become milder in the process. Mechanical polishing is used to improve the appearance of decaffeinated green coffee beans if they are not to be roasted immediately. Extra care is required, however, to store these decaffeinated beans since the loss of wax covering as well as caffeine renders them much more susceptible to fungal attack. [Pg.93]

Granular bed filters are used in porcelain enameling wastewater treatment to remove residual solids from clarifier effluent (sedimentation effluent or flotation effluent). Filtration polishes the effluent and reduces suspended solids and insoluble precipitated metals to very low levels. Fine sand and coal are media commonly utilized in granular bed filtration. The filter is backwashed after becoming loaded with solids and the backwash is returned to the treatment plant influent for removal of solids in the clarification step.10-12... [Pg.329]

The three polymers that were chosen for study, e.g. PMMA (2), BPDN (3), and Hytrel (4), were selected because they represent a wide range of viscoelastic materials. These materials were processed into plaques. The plaques were annealed at 12S°C between highly polished chrome plated flat plates and cooled slowly to minimize the effects of residual stresses. Viscoelastic measurements were made under conditions cited above on two test specimens that were cut from... [Pg.77]

Evaporation of an ethereal solution of hydrogen peroxide gave a residue of which a drop on a platinum spatula exploded weakly on exposure to flame. When the sample (1-2 g) was stirred with a glass rod (not fire polished), an extremely violent detonation occurred. [Pg.1632]


See other pages where Polish residues is mentioned: [Pg.292]    [Pg.334]    [Pg.61]    [Pg.104]    [Pg.436]    [Pg.14]    [Pg.292]    [Pg.334]    [Pg.61]    [Pg.104]    [Pg.436]    [Pg.14]    [Pg.1030]    [Pg.13]    [Pg.164]    [Pg.172]    [Pg.11]    [Pg.486]    [Pg.230]    [Pg.350]    [Pg.137]    [Pg.327]    [Pg.460]    [Pg.300]    [Pg.302]    [Pg.96]    [Pg.236]    [Pg.78]    [Pg.94]    [Pg.94]    [Pg.95]    [Pg.340]    [Pg.1030]    [Pg.177]    [Pg.300]    [Pg.180]    [Pg.135]   
See also in sourсe #XX -- [ Pg.436 , Pg.437 , Pg.438 , Pg.438 , Pg.446 , Pg.447 , Pg.448 , Pg.449 , Pg.450 ]




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