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Polish lapping

Loose abrasive nanometric machining. This method uses loose abrasive grits to remove a small amount of materials. It consists of polishing, lapping and honing, etc. [Pg.215]

Even polished, lapped, metal surfaces have irregularities of about 10 m and such pits can trap air. If no air is trapped in the pits of the metal then one can see that the surface wetting and adhesive coverage would be complete. Any entrapment of air will lead to incomplete adhesive/metal coverage and much will depend upon the contact angle of the adhesive and capillary attraction. The critical angle for perfect contact between adhesive and substrate approaches zero. [Pg.336]

Flat surface through milling, grinding, lapping, polish lapping, polishing ... [Pg.547]

The next processing step is polish lapping where elastic tools such as hard wood, plastic, vulcanized fiber, rubber, etc., are used. In polish lapping, the diamond bodies are pressed into the mold by consciously applying pressure. [Pg.555]

The elastic tool holder avoids the hard components and washes out the softer parts. The longer elastic polish agent carriers are used the coarser the crystal structure, the greater the risk of over-polishing, also known as the orange peel effect because of the appearance. Figure 4.71 shows a polish lapping step. [Pg.556]

The surfaces are prepared in a very short time with sintered diamond files or profiled ceramic fiber files. Then, lapping is done without pressure and then polish lapping to a high gloss finish is achieved using vulcanized fiber and wood (Figure 4.75) with some pressure. [Pg.557]

Sodium chloride can be easily polished between use. The crystal is sanded flat with a flnegrade sandpaper if it is freshly cleaved, scratched, or damaged by water. Two polishing laps are prepared. There are different types, but the wet lap can be simply two thicknesses of fine nylon cloth stretched over a flat surface. The wet lap is wetted with water and sprinkled with a little fine polishing powder such as aluminum oxide or cerium oxide. This is rubbed smooth and all excess water is wiped off. The flat salt plate is mbbed about 20 strokes on the wet lap and then, without delay, is buffed about 7 strokes on the dry lap, which can be simply a layer of diaper cloth held flat. Cesium bromide... [Pg.192]

A little practice in polishing and wefghing the absorption tubes is desirable before an actual analysis is carried out. It is important that when the taps on the absorption tubes are off, they should be as far "off" as possible (I. e., hole in lap is 180 away from side-arm hole). [Pg.476]

In addition to then use in bonded and coated products, both natural and manufactured abrasive grains are used loose in such operations as polishing, buffing, lapping, pressure blasting, and barrel finishing. AH of these operations are characterized by very low metal removal rates and are used to improve the surface quaUty of the workpiece. [Pg.16]

Lappen, m. flap tab flange rag lobe, lappen, v.t. lap, (fine-)polish. [Pg.270]

After lapping, the sliders will be cleaned, and then a passivation film of diamond-like carbon (DLC) will be deposited on the surfaces of sliders through chemical vapor deposition (CVD) to protect the pole area from chemical-physical corrosion and electrostatic discharge attack. Corrosion in pole areas will result in loss of read/write functions. A corrosion test was taken to examine the ability of the sliders polished by different slurries as shown in Table 6. It can be seen that the MRR change rate of the sliders polished by UFD slurry is much less than that polished by the slurry T5qre III, that is, the capability of anti-corrosion of the former is much better than that of the latter. [Pg.263]

Mechanical surface preparation shall be performed by wire brushing, grinding, buffing, and polishing when required, to remove harmful defects such as fissures, pits, gouges, folds, laps, or oxides. [Pg.59]

Substrates are prepared for film deposition from the crystals by sawing, lapping and polishing using techniques similar to those used in the semiconductor industry. [Pg.220]

Production loading tools should be hardened (60 Rockwell C is common). The die should be ground, honed, and lapped or polished to an 8 or 16 rms micro-inch finish. Some claim better results if the final operation involves longitudinal rather than rotary motion... [Pg.607]


See other pages where Polish lapping is mentioned: [Pg.194]    [Pg.95]    [Pg.96]    [Pg.256]    [Pg.194]    [Pg.40]    [Pg.255]    [Pg.40]    [Pg.958]    [Pg.547]    [Pg.549]    [Pg.555]    [Pg.555]    [Pg.194]    [Pg.95]    [Pg.96]    [Pg.256]    [Pg.194]    [Pg.40]    [Pg.255]    [Pg.40]    [Pg.958]    [Pg.547]    [Pg.549]    [Pg.555]    [Pg.555]    [Pg.432]    [Pg.13]    [Pg.135]    [Pg.559]    [Pg.125]    [Pg.541]    [Pg.24]    [Pg.69]    [Pg.90]    [Pg.92]    [Pg.93]    [Pg.94]    [Pg.95]    [Pg.96]    [Pg.263]    [Pg.264]    [Pg.104]    [Pg.247]    [Pg.96]    [Pg.528]   
See also in sourсe #XX -- [ Pg.523 ]




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