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Plasma high density

Chen F F 1995 Fleiicon piasma sources High Density Plasma Sources ed O Popov (Park Ridge, MD Noyes)... [Pg.2812]

Many sources of energy are used to excite samples to emit characteristic wavelengths for chemical identification and assay (91,92). Very high temperature sources can be employed but are not necessary. AH materials can be vaporized and excited with temperatures of only a few electron volts. The introduction of samples to be analyzed into high temperature or high density plasmas and thek uniform excitation often are problematic. [Pg.114]

Sawada, K., Brueckner, K. A., Fukuda, N., and Brout, R., Phys. Rev. 108, 507, "Correlation energy of an electron gas at high density plasma oscillations."... [Pg.356]

HIGH DENSITY PLASMA SOURCES edited by Oleg A. Popov... [Pg.2]

The etch experiments were performed using a commercial ICP etcher equipped with an ICP source and a load lock. The substrate susceptor was cooled by He through a chilled fluid. The coil, which was connected to a 13.56 MHz RF power supply, was located on the lid of a ceramic chamber to generate a high density plasma. A bias voltage induced by RF power at... [Pg.377]

Etching- metal and oxide etch equipment are used to remove excess parts of the deposited film. High density plasma sources... [Pg.327]

Inductively coupled plasma Plasmas generated by application of radiofrequency power to a nonresonant inductive coil and maintained by an inductive electromagnetic field. Low-pressure ICP is a high-density plasma source. [Pg.10]

Considerable work in the area of general research on fuel cells, materials and components was reported by Australia, where the government-sponsored fuel cell R D program has made efficiency improvements in fuel cell electrodes by the formation of platinum nano-clusters in porous carbon by high density plasma sputter mechanisms. Initial experiments on the plasma sputter deposition of platinum onto a porous film has shown great promise and aggregates of platinum were detected in the film with a density profile which decreased away from the surface exposed to the plasma. [Pg.108]

Neutron sources -high density plasmas as [PLASMA TECFINOLOGY] (Vol 19)... [Pg.668]

This particular calculation due to Ray [180] gives a new insight into the problem, as the ordering and spacing between the fine structure multiplet components in high density plasma appear to be completely different from that observed for a free system. [Pg.142]

B4.2 Dry etching of GaN and related compounds B2 High-Density Plasma Reactive Ion Etching... [Pg.477]

F. H. Bell and O. Joubert, Polysilicon Gate Etching in High Density Plasmas. 5. Comparison between Quantitative Chemical Analysis of Photoresist and Oxide Masked Polysilicon Gates Etched in Hbr/Cl-2/0-2 Plasmas, J. Vac. Sci. Technol. 5 15, 88-97 (1997). [Pg.57]

As a future plan, we would like to explore a new field where atomic and nuclear physics are related in plasmas and systemize them. Extensions of our research to non-equilibrium, non-thermal and non-isotropic plasma, especially polarization spectroscopy are considered. We would like to develop quantum molecular dynamics for plasma-wall interactions, plasma radiation science, high-density plasma states, and atomic processes in high fields. These... [Pg.371]


See other pages where Plasma high density is mentioned: [Pg.2932]    [Pg.668]    [Pg.1077]    [Pg.108]    [Pg.111]    [Pg.390]    [Pg.149]    [Pg.378]    [Pg.379]    [Pg.325]    [Pg.445]    [Pg.411]    [Pg.150]    [Pg.535]    [Pg.25]    [Pg.107]    [Pg.246]    [Pg.35]    [Pg.109]    [Pg.816]    [Pg.836]    [Pg.108]    [Pg.111]    [Pg.48]    [Pg.25]    [Pg.390]    [Pg.477]    [Pg.480]    [Pg.480]    [Pg.334]    [Pg.81]    [Pg.135]    [Pg.156]    [Pg.377]    [Pg.382]   
See also in sourсe #XX -- [ Pg.350 ]




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Plasmas: density

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