Radio-frequency plasma-assisted

Pai, M. P., Musale, D. V. and Kshirsagar, S. T. (1998), Low-pressure chemical vapour deposition of diamond films in a radio-frequency plasma-assisted hot-filament reactor. Diam. Relat. Mater., 7(10) 1526-1533. 

Further, it should be emphasized that the nature of the active N itself, that is, ammonia or N plasma, drastically influences growth kinetics. Actually, the above considerations on the growth diagram as well as all experimental results reported in this chapter refer to plasma-assisted molecular-beam epitaxy (MBE), active N being obtained by radio frequency cracking of N2 in a plasma cell. 

Deposition and Diffusion of Platinum Nanojjarticles in Porous Carbon Assisted by Plasma Sputtering. Surf. Coat. Technol., Vol. 200, p>p. 391-394 Caillard, A. Charles, C. Ramdutt, D. Boswell, R. Brault, P. (2009). Effect of Nafion and Platinum Content in a Catalyst Layer Processed in a Radio Frequency Helicon Plasma System. /. Phi/s. D Appl. Phys., Vol. 42, No. 045207 Cao, Y. Yang, W. Zhang, W. Liu, G. Yue, P. (2004). Improved Photocatalytic Activity of Sn4+ Dop>ed Ti02 Nanoparticulate Films Preprared by Plasma-Enhanced Chemical Vapor Deposition. New. J. Chem., Vol. 28, pp. 218-222 Carlson, D.E. Wronski, C.R. (1976). Amorphous SiUcon Solar Cell. Appl. Phys. Lett., Vol. 28, pp. 671-673... 

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