Patterned electrodeposition

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An Analysis of Feature-Scale Simulation of Patterned Electrodeposition. 144... 

Fig. 1. Sequence of process steps used in fabricating small features by patterned electrodeposition.

Although thickness uniformity on the workpiece scale is often critical in microelectronic applications, the present article is not primarily concerned with the workpiece scale. One reason for this is that workpiece-seale effects are similar, whether or not the substrate is patterned (although there can be important differences, as discussed in [23]). Our present scope is restricted to the pattern and feature scales, which are more distinctly relevant to patterned electrodeposition. 

Perhaps the first numerical investigation of lithographically patterned electrodeposition was published by Alkire et al. [46]. In this work, the finite-element method was used to calculate the secondary current distribution at an electrode patterned with negligibly thin insulating stripes. (This is classified as a secondary current distribution problem because surface overpotential effects are included but concentration effects are not.) Growth of the electrodeposit was simulated in a series of pseudosteady time steps, where each node on the electrode boundary was moved at each... 

Enough is known about the fundamental forces that determine the current distribution to carry out fairly accurate simulations of simple systems. Although in the electronics industry predictions are currently quite useful for guiding the design and production of components made by patterned electrodeposition, there is ample opportunity for improvement, especially in the following areas. 

Effects that cause non-uniformity in patterned electrodeposition of microscopic features are the subject of J. O. Dukovic s chapter. Mathematical models are used to identify process conditions which lead to flat profiled features of uniform height needed in electronic components. The emergence of computer-aided-design tools for electrochemical microfabrication is discussed. 

A third category of patterned electrodeposition uses a scanning counter electrode moved over the working electrode surface. Polypyrrole [47] and polyaniline [48] tracks of several millimeters in length and tens of microns in width have been produced using this method. Although complex patterns can be prepared, this technique is a serial process and, therefore, inherently slow, so it will likely find only limited applications, such as for prototyping [49]. 

Halpem, A. R. Com, R. M. Lithographically patterned electrodeposition of gold, silver, and nickel nanoring arrays with widely tunable near-infrared plasmonic resonances. ACS Nano 2013,7,1755-1762. 

In Chapter 4, R.D. Rauh introduces the relatively new subject of photoelectrochemical processing. The injection of photon energy at an electrochemical interface adds an extra dimension to the processing capability, be it for selective etching, patterned electrodeposition, or the fabrication of optical elements. These concepts offer intriguing possibilities for the future of both electronic and opto-electronic technologies. 

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