Oxide Buffing

Formulated metal poHshes consist of fine abrasives similar to those involved in industrial buffing operations, ie, pumice, tripoH, kaolin, rouge and crocus iron oxides, and lime. Other ingredients include surfactants (qv), eg, sodium oleate [143-19-1] or sodium dodecylben2enesulfonate [25155-30-0], chelating agents (qv), eg, citric acid [77-92-9], and solvents, eg, alcohols or aUphatic hydrocarbons. 

Mechanical surface preparation shall be performed by wire brushing, grinding, buffing, and polishing when required, to remove harmful defects such as fissures, pits, gouges, folds, laps, or oxides. 

Ruby and Sapphire. Ruby and sapphire are "sister stones" both are gemstone forms of fhe mineral corundum (composed of aluminum oxide). Pure corundum is colorless, buf a variety of frace elemenfs cause corundum to exhibif differenf colors. Ruby is red corundum, while sapphire is corundum in all colors excepf red. The red in rubies is caused by frace amounfs of chromium fhe more intense the red color of a ruby, fhe more chromium it contains. The blue in sapphires is caused by titanium and/or iron impurities (Garland 2002 Hughes 1997). 

If temperatures are not specified in the specification, the immersion tests have to be carried out at room temperature. The volume of the immersion liquids should be adequate enough to immerse the sample of rubber. The test should be carried out in the absence of direct sunlight to avoid atmospheric oxidation. Test pieces from cut samples or counter samples from the finished rubber lining compound have to be buffed smooth. 

To use an ultrasonic cleaner, immerse the item to be cleaned in the cleaning solution within the device s tank. There are general-purpose and industrial-strength cleaning solutions as well as specific cleaning solutions for jewelry, oxides, and buffing compound removers. Turn the ultrasonic cleaner on for several minutes, and see if your item is clean. If not, repeat the process and/or try an alternate cleaning method. After an item has been cleaned, rinse as you would with a soap and water wash. 

As expected, no photodegradation of benzyl alcohol or phenol was observed in oxygenafed solution under irradiation but without catalyst. In the presence of cafalysf buf without irradiation no oxidation of benzyl alcohol or phenol was defecfed but a small adsorption of benzyl alcohol was measured while for phenol it was negligible. 

They suggested that a phosphorus-rich layer supported on the surface of (VO)2P207 is responsible for the oxidation of bufane to MA. For catalysts with P/V ratios between 1.0 and 2.0, Satsuma et al. (135) also foimd improvements in the catalytic performance. They proposed fhaf at P/V ratios <1.0, a number of vanadium sifes remained inactive, buf af fhe higher P/V ratios, all the surface sifes were active. 

Shen JJ, Costas WB, Cook LM. The effect of post chemical mechanical planarization buffing on defect density of tungsten and oxide wafers. J Electorchem Soc 1998 145(12) 4240-4243. 

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