Big Chemical Encyclopedia

Chemical substances, components, reactions, process design ...

Articles Figures Tables About

Nanoimprint Mold Fabrication

Nanohole array fabrication process (Ic) Cr is selectively deposited on polymer template using shadow evaporation (Id) Si02 layer is etched using Cr mask by Rl E (le) Cr mask and [Pg.184]

The novel ESSENCIAL-based technique shows the most optimum BHJ morphology compared with conventional methods and permits us to realize high-speed roll-to-roH process for mass production of low-cost high-eflEdency polymer PV cells. Furthermore, for the ideal polymer PV cell structures, nanopUlar- and nanohole-type [Pg.186]

Both the inset images are the high-magnification SEM images. All the images are 45° tilted views. Reproduced with permission from Ref [52]. Copyright 2009, ACS Publications. [Pg.187]

1 Peumans, P., Yakimov, A., and Forrest, S. R. (2003) Small molecular weight organic thin-film photodetectors and solar cells. J. Appl. Phys., 93, 3693-3723. [Pg.187]

3 Coakley, K.M. and McGehee, M.D. (2004) Conjugated polymer photovoltaic cells. Chem. Mater., 16, 4533-4542. [Pg.187]


Fig. 8.7 Fabrication sequence of a polymer microring resonator (a) prepare a nanoimprint mold (b) spin coat a polymer thin film (c) perform nanoimprinting process (d) separate the sample from the mold (e) dry etch the residual layer (f) create pedestals by wet etch... Fig. 8.7 Fabrication sequence of a polymer microring resonator (a) prepare a nanoimprint mold (b) spin coat a polymer thin film (c) perform nanoimprinting process (d) separate the sample from the mold (e) dry etch the residual layer (f) create pedestals by wet etch...
Ishii, Y. and J. Taniguchi. 2007. Fabrication of three-dimensional nanoimprint mold using inoiganic resist in low accelerating voltage electron beam lithography. Microelectronic Engineering 84 912-915. [Pg.445]

It has been reported that with thermal nanoimprint it is possible to achieve resolutions of less than 10 nm in pattern transfer. It has been confirmed that no resolution limit exists in nanoimprint, and resolution is controlled by the accuracy of mold fabrication. It is possible to produce fine patterns similar to photolithography without high-cost equipment in nanoimprint. PMMA is superior for thermal plasticity polymers because of its stability in division. [Pg.122]

The ability to fabricate nanostructures is essential to modem science and technology [1], Nanoimprint lithography (NIL) in its various forms has demonstrated potential applications in the fabrication of semiconductor devices, microfluidic devices, optical components, photonic devices, replica mold components and biological objects [2],... [Pg.553]


See other pages where Nanoimprint Mold Fabrication is mentioned: [Pg.183]    [Pg.183]    [Pg.434]    [Pg.435]    [Pg.121]    [Pg.183]    [Pg.186]    [Pg.6]    [Pg.32]    [Pg.188]    [Pg.188]    [Pg.1798]    [Pg.476]    [Pg.97]    [Pg.2087]    [Pg.2087]    [Pg.2089]    [Pg.2346]    [Pg.2779]    [Pg.183]    [Pg.3602]    [Pg.434]    [Pg.1411]    [Pg.1683]    [Pg.218]    [Pg.2461]    [Pg.2850]   


SEARCH



Mold fabrication

Nanoimprint

Nanoimprint mold

© 2024 chempedia.info