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Metalization-molecular dissociation transition

The dynamics of fast processes such as electron and energy transfers and vibrational and electronic deexcitations can be probed by using short-pulsed lasers. The experimental developments that have made possible the direct probing of molecular dissociation steps and other ultrafast processes in real time (in the femtosecond time range) have, in a few cases, been extended to the study of surface phenomena. For instance, two-photon photoemission has been used to study the dynamics of electrons at interfaces [ ]. Vibrational relaxation times have also been measured for a number of modes such as the 0-Fl stretching m silica and the C-0 stretching in carbon monoxide adsorbed on transition metals [ ]. Pump-probe laser experiments such as these are difficult, but the field is still in its infancy, and much is expected in this direction m the near fiitiire. [Pg.1790]

Carbon monoxide is chemisorbed molecularly on some transition metals but dissociatively on others. An approximate borderline can be drawn through... [Pg.35]

Looking at the trends in dissociation probability across the transition metal series, dissociation is favored towards the left, and associative chemisorption towards the right. This is nicely illustrated for CO on the 4d transition metals in Fig. 6.36, which shows how, for Pd and Ag, molecular adsorption of CO is more stable than adsorption of the dissociation products. Rhodium is a borderline case and to the left of rhodium dissociation is favored. Note that the heat of adsorption of the C and O atoms changes much more steeply across the periodic table than that for the CO molecule. A similar situation occurs with NO, which, however, is more reactive than CO, and hence barriers for dissociation are considerably lower for NO. [Pg.257]

Alkali-metals are frequently used in heterogeneous catalysis to modify adsorption of diatomic molecules over transition metals through the alteration of relative surface coverages and dissociation probabilities of these molecules.21 Alkali-metals are electropositive promoters for red-ox reactions they are electron donors due to the presence of a weakly bonded s electron, and thus they enhance the chemisorption of electron acceptor adsorbates and weaken chemisorption of electron donor adsorbates.22 The effect of alkali-metal promotion over transition metal surfaces was observed as the facilitation of dissociation of diatomic molecules, originating from alkali mediated electron enrichment of the metal phase and increased basic strength of the surface.23 The increased electron density on the transition metal results in enhanced back-donation of electrons from Pd-3d orbitals to the antibonding jr-molecular orbitals of adsorbed CO, and this effect has been observed as a downward shift in the IR spectra of CO adsorbed on Na-promoted Pd catalysts.24 Alkali-metal-promotion has previously been applied to a number of supported transition metal systems, and it was observed to facilitate the weakening of C-0 and N-0 bonds, upon the chemisorption of these diatomic molecules over alkali-metal promoted surfaces.25,26... [Pg.360]

Fujii et al.30 have reported experimental evidence for the molecular dissociation process in Br2 near 80 GPa. This transition, which is coincident with the onset of pressure-induced metallization, was first discovered in molecular/metallic iodine.3 A diatomic molecular crystal loses its molecular character in the limit when the intermolecular distance becomes equal to the intramolecular bond length. Fujii et al.30 applied the Herzfeld criterion to I2 and Br2 and estimated that the molar reffactivity reaches the atomic limit around 20 GPa in I2 and 80 GPa in B12. In both cases, the computed pressure coincides with that for molecular dissociation accompanied by metallization. [Pg.186]

The chemisorption of CO is molecular on some transition metals and dissociative on others, depending on the electronic structure of the metal (Table 5-5). [Pg.122]

As noted in Sect. 5.1.2, underpressure of 21 and 80 GPa the molecular stmctures of I2 and Br2, respectively, undergo a dissociation to form monatomic (metal-like) structures. Transition of molecular stmctures into atomic lattices under high pressure were observed in HCl (at 51 GPa), HBr (at 42 GPa), H2O (at 60 GPa) [101] and H2S (molecular dissociation at 44 and metallization at 96 GPa) [102,103]. HI turns from an insulator into a molecular conductor at 45 GPa, and then to a monatomic metal at 51 GPa [104]. [Pg.421]

This backdonation of electron density from the metal surface also results in an unusually low N-N streching frequency in the a-N2 state compared to the one in the y-N2 state, i.e. 1415 cm 1 and 2100 cm"1, respectively, for Fe(l 11)68. Thus the propensity for dissociation of the a-N2 state is comparatively higher and this state is considered as a precursor for dissociation. Because of the weak adsorption of the y-state both the corresponding adsorption rate and saturation coverage for molecular nitrogen are strongly dependent on the adsorption temperature. At room temperature on most transition metals the initial sticking coefficient does not exceed 10 3. [Pg.50]

To dissociate molecules in an adsorbed layer of oxide, a spillover (photospillover) phenomenon can be used with prior activation of the surface of zinc oxide by particles (clusters) of Pt, Pd, Ni, etc. In the course of adsorption of molecular gases (especially H2, O2) or more complex molecules these particles emit (generate) active particles on the surface of substrate [12], which are capable, as we have already noted, to affect considerably the impurity conductivity even at minor concentrations. Thus, the semiconductor oxide activated by cluster particles of transition metals plays a double role of both activator and analyzer (sensor). The latter conclusion is proved by a large number of papers discussed in detail in review [13]. The papers cited maintain that the particles formed during the process of activation are fairly active as to their influence on the electrical properties of sensors made of semiconductor oxides in the form of thin sintered films. [Pg.177]

Yildirim, T., J. Iniguez, S. Ciraci, Molecular and dissociative adsorption of multiple hydrogen molecules on transition metal decorated C60. Phys. Rev. B Condens. Matter Mater. Phys. 72(15), 153403 (4 pages), 2005. [Pg.435]

Co2(CO)q system, reveals that the reactions proceed through mononuclear transition states and intermediates, many of which have established precedents. The major pathway requires neither radical intermediates nor free formaldehyde. The observed rate laws, product distributions, kinetic isotope effects, solvent effects, and thermochemical parameters are accounted for by the proposed mechanistic scheme. Significant support of the proposed scheme at every crucial step is provided by a new type of semi-empirical molecular-orbital calculation which is parameterized via known bond-dissociation energies. The results may serve as a starting point for more detailed calculations. Generalization to other transition-metal catalyzed systems is not yet possible. [Pg.39]


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See also in sourсe #XX -- [ Pg.680 ]




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Metalization-molecular dissociation

Metallic molecular

Molecular metal

Molecular transition

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