Nanofabricated material

Several striking examples demonstrating the atomically precise control exercised by the STM have been reported. A "quantum corral" of Fe atoms has been fabricated by placing 48 atoms in a circle on a flat Cu(lll) surface at 4K (Fig. 4) (94). Both STM (under ultrahigh vacuum) and atomic force microscopy (AFM, under ambient conditions) have been employed to fabricate nanoscale magnetic mounds of Fe, Co, Ni, and CoCr on metal and insulator substrates (95). The AFM has also been used to deposit organic material, such as octadecanethiol onto the surface of mica (96). New appHcations of this type of nanofabrication ate being reported at an ever-faster rate (97—99). 

Filling CNTs represents a remarkable example of manipulation of matter at the nanometric level. The experiments described here clearly show example of the capacities and potentialities for nanofabrication of novel materials. 

Clark, P., in Nanofabrication and Biosystems Integrating Materials Science, Engineering and Biology (H. C. Hoch, L. W. Jelinski, and H. G. Craighead, Eds.), p. 357. Cambridge University Press, Cambridge, UK (1996). 

Electroless deposition as we know it today has had many applications, e.g., in corrosion prevention [5-8], and electronics [9]. Although it yields a limited number of metals and alloys compared to electrodeposition, materials with unique properties, such as Ni-P (corrosion resistance) and Co-P (magnetic properties), are readily obtained by electroless deposition. It is in principle easier to obtain coatings of uniform thickness and composition using the electroless process, since one does not have the current density uniformity problem of electrodeposition. However, as we shall see, the practitioner of electroless deposition needs to be aware of the actions of solution additives and dissolved O2 gas on deposition kinetics, which affect deposit thickness and composition uniformity. Nevertheless, electroless deposition is experiencing increased interest in microelectronics, in part due to the need to replace expensive vacuum metallization methods with less expensive and selective deposition methods. The need to find creative deposition methods in the emerging field of nanofabrication is generating much interest in electroless deposition, at the present time more so as a useful process however, than as a subject of serious research. 

In order to achieve improved nanofabrication performance, novel functional block copolymer systems are strongly desired. Many researchers have recognized this, and novel functional systems such as metal-containing block copolymer systems have significantly simplified and improved nanofabrication processes. The combination of top-down microscale patterns with the bottom-up nanopatterns are attractive for integrating functional nanostructures into multipurpose on-chip devices. However, in order to use these materials in real-time applications, further development is still needed. More ground-shaking discoveries are needed and are also fully expected. 

Acknowledgements The research reported here was supported by the Nanobiotechnogy Center (NBTC), an STC Program of the National Science Foundation under Agreement No. ECS-9876771. We also thanks the Cornell Center for Materials Research (CCMR) and Cornell Nanofabrication Center (CNF) for use of their facilities. 

This work is currently supported by NSF grant DMR 9313371 and by the Materials Science Center at Cornell University under NSF Grant DMR 9121654. We are particularly grateful to the staff of the Cornell Nanofabrication Facility for their assistance in creating the periodic starting stractures. The LEEM experiments on Si were carried out in collaboration with Ruud Tromp and Marion Mankos at IBM, Yorktown Heights, NY. Norm Bartelt of Sandia Labs, Livermore, CA has modeled the kinetics of the island and hole decay on the 2-D gratings. 

The challenges in this field rest on improving sensitivity and specificity, and reducing the power drain to allow the manufacture of palmtop, wristwatch-size, or even smaller sensors. Advances in microelectronics have enabled the fabrication of compact, portable, low-power devices, and advances in power somces, miniaturization techniques, nanofabrication tools, and fundamental materials chemistiy should allow this trend to continue. 

Electron beam resist has been a key material for mask fabrication in the semiconductor industry. EB and x-ray lithography have recently attracted much attention as not only a next-generation lithography in the semiconductor industry but also a nanofabrication tool... 

In recent times the incorporation of enzymes into nanostructured materials is commonly referred to as nanobiocatalysis. Nanobiocatalysis has emerged as a rapidly growing research and development area. Lately, nanobiocatalytic approaches have evolved beyond simple enzyme immobilization strategies to include also topics like artificial enzymes and cells, nanofabrication, and nanopatterning [18]. A recent bibliometric analysis [19] of nanobiocatalysis publications shows a strong increase within the last decade (Fig. 14.1). The analysis has been compiled from... 

Department of Chemistry, Center for Nanofabrication and Molecular Self-Assembly and Materials Research Center, Northwestern University, 2145 Sheridan Road, Evanston, IL 60208, USA E-mail aburin tulane.edu... 

One kind of nanostructured or nanofabricated material has been generated by the introduction of high-density defects into a nanosized region of a perfect... 

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