Light sensitive polymers properties

Phthalocyanines have been used to incorporate semiconductor properties in polymers (182) or to develop a thin-film transistor (183). Phthalocyanines and their derivatives can act as dyes in color photography (qv) (184) or electrophotography (185). Light-sensitive compositions for use on Hthographic plates are comprised in part of copper phthalocyanine blue (186). Dichlorosilicon phthalocyanine [19333-10-9] has been used in the... 

Polysilanes with alkoxy groups are more light sensitive than conventional polysilanes. They degrade rapidly in the presence of light in agreement with the facile formation of silylene from dialkoxydisilanes. Properties of these polymers are currently being investigated. 

Various materials have been examined for use as deep UV resists poly(methyl methacrylate) (PMMA) (1), poly(methyl isopropenyl ketone) (PMIPK) fS.7L and the novolak-Meldrum s acid solution inhibition system (S). Each however has a problem related to sensitivity and/or resolution. While PMMA is insensitive to light of X > 230 nm because of its weak absorption, its high resolution properties make it an attractive starting point for the design of a resist that will perform well in the 230-280 region. The photochemical properties of PMMA could be modified by the incorporation of a small percentage of photolabile groups so as to have both the desired sensitivity and base polymer properties. 

Olefin-carbon monoxide co-polymers of the type (-RCH-CH2-CO-)n, known as polyketones, have a wide variety of interesting properties, such as thermoplasticity, flexibility, durability and high impact strength. The ketone function in the polymer makes them sensitive to UV radiation and as a consequence they are photodegradable and hence environmentally acceptable plastics. However their light sensitivity has limited their applications. They can be made by the copolymerisation of an alkene with carbon monoxide (Equation 27 see also Chapter 7, Section 7.7) ... 

Morrow (52) has described a DTA-light photometer polarizing system for hot-stage microscopy. Thermocouple wires. 0.003 in. in diameter, were used to detect the 7 — Tr) temperature difference fo r simultaneous DT A measurements. Sample capsules were fabricated by bending small, identical stripes of AI foil over both sample and reference thermojunctions. A small hole in the foils permitted the viewing of the sample by transmitted light microscopy. The primary use of the apparatus was to study the thermal properties of thermally sensitive polymers (84). 

Alkali and acid treatments have also been used to modify surface properties of polymers sulfonated polyethylene films treated first with ethylenediamine and then with a terpolymer of vinyhdene chloride, acrylonitrile, and acrylic acid exhibited better clarity and scuff resistance and reduced permeabihty. Permanently amber-colored polyethylene containers suitable for storing light-sensitive compoimds have been produced by treating fluorosulfonated polyethylene with alkali. Poly(ethylene terephthalate) dipped into trichloroacetic/chromic acid mixture has improved adhesion to polyethylene and nylons. Antifogging lenses have been prepared by exposing polystyrene films to sulfonating conditions. Acid and alkali surface treatments have also been used to produce desired properties in polymethylmethacrylates, polyacrylonitrile, styrene-butadiene resins, polyisobutylene, and natural rubber. Surface halogenation of the diene polymers natural rubber and polyisobutylene resulted in increased adhesion to polar surfaces. 

However, it is often difficult to remove trace amounts of copper adsorbed by the polymer. The synthesis, characterization, and some properties of the light-sensitive DA-containing polymers, 1 and 2, enq>loyed for this study have been reported previously by the authors 15J6J7J8J9). A few novel aromatic DA-containing, ligjht-insensitive polyesters, 3 and 4, were also synthesized. Their structures are shown in Chart 1. 

Moreover, some investigations have dealt with the combination of the photonic properties and the ordered porous structure for light-harvesting or emitting. In both cases, light-sensitive honeycomb films based on semi-conductive NPs or conjugated polymers were used to improve the opto-electronic properties of organic thin-film devices [126, 161, 174,176, 190-192]. 

Properties M.w. 176.22 dens. 1.040 b.p. 95-98 C (4 mm) flash pt. (CC) 225 F ref. index 1.5120 Toxicology Possible sensitizer TSCA listed Storage Heat- and light-sensitive Uses Comonomer for vinyl/acrylic resins Manuf./Distrib. Aldrich http //www.sigma-aidrich.com] Ciba Spec. Chems./Water Treatment Monomer-Polymer Dajac Labs Rohm Am. http //www.rohmamerica.com... 

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