Hydrogen Free Amorphous Carbon ta-C

Mass selected ion beam deposition is a special method with well defined conditions concerning ion masses and energies. Hofsass et al. [21] for example used C ions, in the most cases with deposition energies of 100 eV. This method is interesting for basic research, but seems to have no perspectives for industrial uses. 

Several models are presently under discussion to explain the formation of highly tetrahedrally coordinated carbon ta-C. According to one of these theories the ta-C deposition can be described as a subplantation process [19, 29]. The principle of this process is that carbon ions penetrate the first atomic layers and enter interstitial positions, thereby increasing the local density and inducing local compressive 

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