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High step

To determine whether the 8CB droplets condensed above 41°C (trapped in the isotropic phase) sit on a trilayer or on bare silicon, we used the ATM tip to mechanically spread the droplets and thus accelerate their conversion to a stable configuration. The SPFM images shown in Fignre 15 were obtained after such tip-induced spreading. A layered structure with 32-A-high steps typical of the smectic phase is obtained. The first, or bottom, layer is 41 A thick, while the layers above it are all 32 A thick. This indicates that the bottom layer of the film is a trilayer and that the remaining snbstrate is dry silicon, i.e.. [Pg.263]

In the following section, we focus on imaging single-crystal electrode surfaces that are of relevance to electrocatalysis. We will first deal with flat, defect-free terraces as well as with more real surfaces with monoatomic high steps as the most common active sites. We will then explore various strategies for nano structuring surfaces, for example, by repetitive oxidation-reduction cycles (ORCs). [Pg.119]

Fig. 11. X-t scan with an STM, showing the structure transition from ( /3 x /3) / 30" to (1 x 1) within a Cu adlayer on Au(lll) in 0.05 M H2SO4 + 1 mM CUSO4, induced by a potential step from +0.12 to +0.04 V vs. Cu/Cu++ at t — 1 s. The transition is seen to start from a monoatomic high step [46]. Fig. 11. X-t scan with an STM, showing the structure transition from ( /3 x /3) / 30" to (1 x 1) within a Cu adlayer on Au(lll) in 0.05 M H2SO4 + 1 mM CUSO4, induced by a potential step from +0.12 to +0.04 V vs. Cu/Cu++ at t — 1 s. The transition is seen to start from a monoatomic high step [46].
Fig. 17. STM image of Au(lll) in 0.05 M H2SO4 + 0.2 mM CUSO4 after stepping the potential from +0.01 V to -0.31 V vs. Cu/Cu++ (see arrow). Again, Cu is seen to deposit exclusively at the monoatomic high steps of the substrate. Fig. 17. STM image of Au(lll) in 0.05 M H2SO4 + 0.2 mM CUSO4 after stepping the potential from +0.01 V to -0.31 V vs. Cu/Cu++ (see arrow). Again, Cu is seen to deposit exclusively at the monoatomic high steps of the substrate.
A similar effect was observed in our work and in the work of others (5), where voltammetry curves changed after extended cycling, particularly if the cathodic sweep was reversed before the full Pb deposition coverage. The observed "cathodic memory effect" may be due to the proposed structural transformation phenomenon and subsequent step density growth, initially facilitated by a high step density on a UHV-prepared or chemically polished (6) Ag(lll) substrate. Post electrochemical LEED analysis on Ag(lll)-Pb(UPD) surfaces provided additional evidence of a step density increase during Pb underpotential deposition, which will be discussed later in this text. (See Figure 3.)... [Pg.145]

Au is an excellent electrode material. It is inert in most electrochemical environments, and its surface chemistry is moderately well understood. It is not, however, the substrate of choice for the epitaxial formation of most compounds. One major problem with Au is that it is not well lattice matched with the compounds being deposited. There are cases where fortuitous lattice matches are found, such as with CdSe on Au(lll), where the Vs times the lattice constant of CdSe match up with three times the Au (Fig. 63B) [115,125]. However, there is still a 0.6% mismatch. A second problem has to do with formation of a compound on an elemental substrate (Fig. 65) [384-387]. Two types of problems are depicted in Fig. 65. In Fig. 65A the first element incompletely covers the surface, so that when an atomic layer of the second element is deposited, antiphase boundaries result on the surface between the domains. These boundaries may then propagate as the deposit grows. In Fig. 65b the presence of an atomically high step in the substrate is seen to also promote the formation of antiphase boundaries. The first atomic layer is seen to be complete in this case, but when an atomic layer of the second element is deposited on top, a boundary forms at the step edge. Both of the scenarios in Fig. 65 are avoided by use of a compound substrate. [Pg.180]

With severe intoxication, lesions of the anterior horn cells and the pyramidal tracts may also occur. Muscular weakness may increase over a period of several weeks or months recovery may take months or years and in 25-30% of cases, permanent residual effects remain, usually confined to the lower limbs. Gait impairment, characterized by high steps and footdrop and permanent in some, was called Jake Walk. ... [Pg.716]

In another work from this series [433], deposition of Pd on the unreconstructed Au(llO) has been studied. An ordered adlayer of PdCfi " was imaged with atomic resolution. Pd deposition started at monoatomic high steps. From the coulo-metric data, it follows that approximately three monolayer equivalents are deposited in the UPD range, what may, in turn, be a result of the surface alloy formation. [Pg.888]

Another feature of the spiral tip is that it has an abnormally high step and kink density and perhaps the tip has a higher exchange-current density for deposition than the corresponding planar surface. If this were so, the activation overpotential would be much less at the tip of the spiral than around its base. [Pg.621]

Depositions were obtained from either AlCl3 or Al(CH3)3 mixed with either Ar or H2, or both. The plasma was excited by a 13.56 MHz source. At a power level of 200 watts, the deposition rate was 250 A/min. Step coverage over 1 micron high steps was at least 50%. [Pg.148]

The interaction of molecules with substrate atoms at step edges is usually stronger than with those of a flat terrace. This has consequences for the long-range structure, if the number of step edges becomes considerably large. The Cu(332) surface has a high step density and its (lll)-terraces have a width of only 1.2 nm. The distance perpendicular to the steps is just sufficient for one [7]H molecule, and only formation of molecular rows parallel to the steps is possible. This ID confinement and a specific molecule-step in-... [Pg.235]


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See also in sourсe #XX -- [ Pg.173 ]




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