Halides chemical vapor deposition

Ottosson, M., Harsta, A., and Carlsson, J., Thermodynamic Analysis of Chemical Vapor Deposition of YBa2Cu307 from Different Halide Precursors, Prac. 11th. Int. Conf. on CVD, (K. Spear and G. Cullen, eds ), pp. 180-187, Electrochem. Soc., Pennington, NJ 08534 (1990)... 

Inside" processes—such as modified chemical vapor deposition (MCVD) and plasma chemical vapor deposition (PCVD)—deposit doped silica on the interior surface of a fused silica tube. In MCVD, the oxidation of the halide reactants is initiated by a flame that heats the outside of the tube (Figure 4.8). In PCVD, the reaction is initiated by a microwave plasma. More than a hundred different layers with different refractive indexes (a function of glass composition) may be deposited by either process before the tube is collapsed to form a glass rod. 

Bismuth is an important element in many of the new high-temperature, oxide superconductors and in a variety of heterogeneous mixed oxide catalysts. Some of the methods employed in the preparation of these materials, namely sol-gel and chemical vapor deposition processes, require bismuth alkoxides as precursors and a number of papers on these compounds have recently been published.1 One synthetic route to bismuth alkoxides, which avoids the more commonly used trihalide starting materials and the often troublesome separation of alkali metal halides, involves the reaction between a bismuth amide and an alcohol according to the following equation ... 

Bernard C, Madar R (1992) Thermochemistry in CVD-on the choice of halide gas species. In Besmann TM, Gallois BM, Warren JW (eds) Chemical vapor deposition of refractory metals and ceramics II. Materials Research Society, Pittsburg, PA, pp3-15... 

The study of gaseous metal halide complexes is of fundamental interest for the chemistry of coordination compounds. In addition, gaseous metal halide species are of practical importance for material science and technical applications. These practical aspects are reported briefly in the recent review by Schafer [425] and in detail in the book by Hastie [428]. The potential of enhanced vapor phase material transport is for example an important practical aspect and has been described in the monograph by Schafer [437]. It is of interest for metal halide lamps, chemical vapor deposition, and metallurgical processes. The practical significance of complexation for metal halide lamps and the experimental methods used in addition to Knudsen effusion mass spectrometry for the study of metal halide vapors are reported in the recent review article by Hilpert [438]. 

The MCVD modified chemical vapor deposition) method also relies on the production of glass from halide vapors. The deposition process occurs inside a vitreous silica tube, which is heated from the outside and which serves as the cladding for the fiber. The reaction of the vapors now occurs without contamination by gases from the flames, which never contact the deposited material. Consolidation of the soot occurs simultaneously with deposition. The process continues until the desired layer thickness is reached, after which the entire tube is collapsed by increasing the external temperature to complete the preform. 

Preparation of uranium metal. As discussed previously, some nuclear power plant reactors such as the UNGG type have required in the past a nonenriched uranium metal as nuclear fuel. Hence, such reactors were the major consumer of pure uranium metal. Uranium metal can be prepared using several reduction processes. First, it can be obtained by direct reduction of uranium halides (e.g., uranium tetrafluoride) by molten alkali metals (e.g., Na, K) or alkali-earth metals (e.g.. Mg, Ca). For instance, in the Ames process, uranium tetrafluoride, UF, is directly reduced by molten calcium or magnesium at yoO C in a steel bomb. Another process consists in reducing uranium oxides with calcium, aluminum (i.e., thermite or aluminothermic process), or carbon. Third, the pure metal can also be recovered by molten-salt electrolysis of a fused bath made of a molten mixture of CaCl and NaCl, with a solute of KUFj or UF. However, like hafnium or zirconium, high-purity uranium can be prepared according to the Van Arkel-deBoer process, i.e., by the hot-wire process, which consists of thermal decomposition of uranium halides on a hot tungsten filament (similar in that way to chemical vapor deposition, CVD). 

Ac = acetyl Bu = tertiary butyl CN = coordination number Cp = pentamethylcyclopentadienyl DME = l,2-dimethoxye ane DABCO = l,4-diazabicyclo[2.2.2] octane Eq. = equation equiv = equivalent(s) Et = ethyl IR = infrared (spectroscopy) Ln = rare earth metal (Sc, Y, La Ce-Lu) M = metal MOCVD = metal organic chemical vapor deposition Pti = isopropyl Py = pyridine R = alkyl Ar = aryl THE = tetrahydroftnan TM = transition metal X = halide. 

John specialized in fluorine, boron, sulfur, phosphorus, and metal carbonyl chemistry. With M. Frederick Hawthorne, he discovered a series of amine complexes of aluminum trihydride and showed that some of them give aluminum metal when heated this process later became useful for the formation of aluminum thin films by chemical vapor deposition. One of his notable achievements was the discovery that the PPN cation, bisftriphenylphosphoranyhdene) ammonium, forms air-stable salts with many air-sensitive anions such as [Co(CO)4] . He also discovered that cesium fluoride can serve as a catalyst for the synthesis of organic fluoroxy compounds (RpOF) by the fluorination of acyl halides. 

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