Glow discharge reactions

Hexafluoroacetone is not known to polymerize by a free radical mechanism, however, it reacts readily with nucleophilic reactants and can form copolymers via nucleophilic intermediates (13). Many of its derivatives create surfaces with low critical surface tensions ( ). It was theorized that in a mild glow discharge reaction, the carbonyl group could be activated and the C3FgO group might... 

Byrne GA, Brown KC. Modifications of textiles by glow-discharge reactions. J. Soc. Dyers Colourists. 1972 86 113-117... 

Poll Fl-U, Arzt M and Wickleder K-FI 1976 Reaction kinetics in the polymerization of thin films on the electrodes of a glow-discharge gap Eur. Polym. J 12 505-12... 

Vapor—vapor reactions (14,16,17) are responsible for the majority of ceramic powders produced by vapor-phase synthesis. This process iavolves heating two or more vapor species which react to form the desired product powder. Reactant gases can be heated ia a resistance furnace, ia a glow discharge plasma at reduced pressure, or by a laser beam. Titania [13463-67-7] Ti02, siUca, siUcon carbide, and siUcon nitride, Si N, are among some of the technologically important ceramic powders produced by vapor—vapor reactions. 

Mass spectrometric studies of the ionic species which arrive at the cathode of both glow and corona discharges yield useful information regarding ion-molecule reactions which occur within these systems. Glow discharges have been used to study endothermic reactions, and their usefulness and limitations have been demonstrated by studies of the dissociative charge transfer reactions Ar+ + N2 N+ + N + Ar N2+ + N2 N+ + N + N2 N2+ + 02 0+ + O + N2. Exo-... 

In addition to the thermal CVD reactions described above, a glow discharge plasma at 480-650°C has been used to deposit HB2 from the mixed chlorides,... 

A new synthesis for sigma-bonded, metal alkyls and similar compounds, involving a reaction between metal vapor and free radicals generated in a radio-frequency glow-discharge, has been reported (35). 

Neutron Activation Analysis X-Ray Fluorescence Particle-Induced X-Ray Emission Particle-Induced Nuclear Reaction Analysis Rutherford Backscattering Spectrometry Spark Source Mass Spectrometry Glow Discharge Mass Spectrometry Electron Microprobe Analysis Laser Microprobe Analysis Secondary Ion Mass Analysis Micro-PIXE... 

A wide spectrum of heterogeneous processes can occur at solid surfaces exposed to a glow discharge (5,25,27). The primary processes of interest in plasma etching (and in plasma deposition) are summarized in Table II i20). These interactions result from the bombardment of surfaces by particles. Although vacuum UV photons and soft x-rays present in the plasma are sufficiently energetic to break chemical bonds, electron and particularly ion bombardment has been found to be the most effective method of promoting surface reactions (25). 

Mass spectrometer studies of oxidant additions to fluoro- and chlorocarbon gases have demonstrated that the relative reactivity of atoms with unsaturate species in a glow discharge follows the sequence F -- O > Cl > Br (41), Of course, the most reactive species present will preferentially undergo saturation reactions that reduce polymer formation and that may increase halogen atom concentration. Ultimately, determination of the relative reactivity of the plasma species allows prediction of the primary atomic etchants in a plasma of specific composition. 

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