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Gate dielectric thin-metal films

Gate Dielectrics through Anodization of Thin-Metal Films.240... [Pg.229]

Gate Dielectrics through Anodization oe Thin-Metal Films... [Pg.240]

The other interesting material for electronics is carbon nanotubes. We have shown the application of individual single-walled carbon nanotubes for field effect transistors (FETs) [3]. Carbon nanotubes (CNT) or CNT bundles can be placed between two carbon electrodes playing the role of source and drain. The gate electrode can be made of thin metal stripe under the dielectric film in the region between source and drain. [Pg.465]

The reason for pentacene being superior for the production of TFT devices [7, 8] when compared with other molecules [9] is still not obvious. In this chapter, we will discuss to what extent the peculiar growth properties [10] of pentacene on metallic contacts and gate dielectrics contribute to the device performance. For this purpose, first the early growth state of pentacene films and the molecular structure of the so called thin film phase is reviewed. Then, major sources of crystal defects in thin films as determined by advanced synchrotron diffiaction techniques are discussed. The relation of these defects to the frequently discussed electronic traps that strongly influence transport properties of TFTs [6, 11, 12] is indicated. Finally, the spatially resolved photo response of pentacene OTFTs will be discussed in the context of injection barriers and contact homogeneity. [Pg.301]

The TFT fabrication process on glass substrates starts with 100 nm of Cr for the gate metal, and is followed by a PECVD 200 nm thick Si3N4 dielectric with a 30 nm thick SiC>2 surface layer. The source drain metal is Cr/Au. Each of these layers is patterned using printed wax masks and chemical etching, steps a to d in Fig. 11.8. The surface is modified with a solution deposition of a self-assembled monolayer of octyltrichlorosilane (OTS-8) before inkjet printing deposition of the semiconductor. It has been shown that the OTS-8 layer affects the structural order of PQT-12 in thin films, improving the performance of the TFT [23]. Encapsulation and possibly other subsequent layers may be needed on the TFT, but these are not discussed here. [Pg.280]


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Dielectric films

Film gating

Films metallic

Gate dielectric dielectrics

Metal films

Metallic thin films

Thin film dielectrics

Thin film metal/metallic

Thin film metallization

Thin metallic

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