Film-substrate material combinations

In practice, uniform films are obtained for only a limited number of film-substrate material combinations (17). The more common experience is that the deposited material forms 3D clusters. The clusters may form directly on the bare substrate, in the Volmer-Weber growth mode, or on top of a very thin but uniform film of the deposit, the Stranski-Krastanov growth mode. We now discuss a method for determining the equilibrium configuration of the deposited material. 

Film stress arises owing to the manner of growth and the coefficient of expansion mismatch between the substrate and film material (4). In many CVD processes, high temperatures are used. This restricts the substrate-coating material combinations to ones where the coefficient of thermal expansions can be matched. High temperatures often lead to significant reaction between the deposited material and the substrate, which can also introduce stresses. 

The observation that Langmuir monolayers often exist as phase-separated domains has begun to be exploited as a means to produce LB monolayers with two-dimensional patterns. This approach aims to form, transfer, and stabilize these domains on appropriate substrates by combining the Langmuir-Blodgett method with the covalent bonding aspect of self-assembly. There are a small number of studies, and the possible further functionalization of the domains and use of different combinations of materials make this area promising for the construction of patterned films. 

Luminous vapor treatment without depositing film (LGT) could be used to modify the surface characteristics of membranes. Type B plasma polymer also could be used for this purpose. General schemes of membrane application of LGT and LCVD are schematically depicted in Figures 34.2 and 34.3, respectively [2]. Since the luminous gas interacts with the substrate material, the selection of the membrane material and the gas to be used in these possible schemes is important, and it should not be considered that any combinations of gas and material could be used in any mode of application. 

The adhesion of thin films is influenced by a large number of parameters. Some of these are defined by the choice of materials for the coating and the substrate. The others are influenced by the preparation of the substrate, the coating process and the handling of the film-substrate combination after the coating process is completed. 

The objective of this research Is the examination of the effects of ion bombardment on the structure of thin ceramic films on ceramic substrates. The material combinations will Include oxide films that have (a) no solid solubility, (b) limited solid solubility, and (c) complete solid solubility with the substrate material (also an oxide). Techniques for determination of elastic and plastic properties of thin films or coatings on ceramic substrates and for the determination of the strength of the bond between the film and substrate, which are currently being developed, will be used to determine the hardness, elastic modulus, and adherence of each material combint tion. The main testing techniques will be the ultra-low load micro-indentation tester (Nanaindenter) and thermal cycling tests. 

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